SCHEMBL11111398

SCHEMBL11111398

CCC(C)(O)C#CC#CC(C)(O)CC

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
PGK1 P00558 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15283389 0.92 ALDH1A1 (0.37) ALDH1A1
SCHEMBL28708725 0.87
SCHEMBL127300 0.87 TSHR (0.38) TSHRTDP1PGK1ALDH1A1
SCHEMBL8651161 0.79
SCHEMBL3659091 0.79 TSHR (0.32) TSHRTDP1PGK1
SCHEMBL12778794 0.79 TSHR (0.32) TSHRTDP1PGK1
SCHEMBL5613289 0.79
SCHEMBL3108062 0.77
SCHEMBL2127962 0.77
SCHEMBL28477101 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9163307-B2 Three-dimensional photoresists via functionalization of polymer thin films fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2015-10-20 US claimed
US-20130260054-A1 Three-Dimensional Photoresists via Functionalization of Polymer Thin Films Fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 US claimed
WO-2013148126-A1 THREE-DIMENSIONAL PHOTORESISTS VIA FUNCTIONALIZATION OF POLYMER THIN FILMS FABRICATED BY ICVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 WO claimed
CN-110527084-B Biodegradable L-structure polyaspartic acid high-molecular dispersant and preparation method thereof 合肥博朗德纳米技术有限公司 2022-01-28 CN disclosed
US-9163307-B2 Three-dimensional photoresists via functionalization of polymer thin films fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2015-10-20 US disclosed
US-20130260054-A1 Three-Dimensional Photoresists via Functionalization of Polymer Thin Films Fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 US disclosed
WO-2013148126-A1 THREE-DIMENSIONAL PHOTORESISTS VIA FUNCTIONALIZATION OF POLYMER THIN FILMS FABRICATED BY ICVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 WO disclosed
US-4479016-A Ethoxylates of diacetylene alcohols and the use of these compounds as surfactants BASF AKTIENGESELLSCHAFT (DE) 1984-10-23 US disclosed
US-4111917-A POLYURETHANES W. R. GRACE & CO. (US) 1978-09-05 US disclosed