Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4817502 | 1.00 | — | — | |
| SCHEMBL29637678 | 1.00 | — | — | |
| SCHEMBL31440648 | 0.87 | — | — | |
| Zinc Ion SCHEMBL18395328 | 0.87 | — | — | |
| SCHEMBL31485718 | 0.87 | — | — | |
| SCHEMBL7756013 | 0.87 | — | — | |
| SCHEMBL2455390 | 0.87 | — | — | |
| SCHEMBL3128128 | 0.87 | — | — | |
| SCHEMBL3124814 | 0.87 | — | — | |
| SCHEMBL930930 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 149 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116682983-A | Bismuth platinum/bismuth titanium oxide electrode and preparation method and application thereof | 华南师范大学 | 2023-09-01 | — | — | CN | claimed |
| CN-116615032-A | Semiconductor device including bonding portion and method of manufacturing the same | 爱思开海力士有限公司 | 2023-08-18 | — | — | CN | claimed |
| US-20230260956-A1 | SEMICONDUCTOR DEVICE INCLUDING JOINT PORTION BETWEEN CONDUCTIVE CONNECTION STRUCTURES AND METHOD OF FABRICATING THE SAME | SK HYNIX INC (KR) | 2023-08-17 | — | — | US | claimed |
| US-11515463-B1 | Transparent electrostrictive actuators | META PLATFORMS TECHNOLOGIES, LLC (US) | 2022-11-29 | — | — | US | claimed |
| US-20190019551-A1 | NONVOLATILE MEMORY DEVICE AND METHOD OF OPERATING NONVOLATILE MEMORY DEVICE | SK Hynix Inc. (KR) | 2019-01-17 | — | — | US | claimed |
| CN-102867948-B | Compound, its method for making, negative active core-shell material, negative pole and lithium secondary battery | SAMSUNG SDI CO., LTD. (KR) | 2016-05-11 | — | — | CN | claimed |
| US-9011713-B2 | Composite, method of manufacturing the composite, anode active material including the composite, anode including the anode active material, and lithium secondary battery including the anode | SAMSUNG SDI CO., LTD. (KR) | 2015-04-21 | — | — | US | claimed |
| EP-2544269-B1 | Composite, method of manufacturing the composite, anode active material including the composite, anode including the anode active material, and lithium secondary battery including the anode | SAMSUNG SDI CO LTD (KR) | 2014-03-12 | — | — | EP | claimed |
| EP-2166542-B1 | Boiling water reactor core local power range monitoring system and method | GE HITACHI NUCL ENERGY AMERICA (US) | 2013-09-11 | — | — | EP | claimed |
| US-20130009091-A1 | COMPOSITE, METHOD OF MANUFACTURING THE COMPOSITE, ANODE ACTIVE MATERIAL INCLUDING THE COMPOSITE, ANODE INCLUDING THE ANODE ACTIVE MATERIAL, AND LITHIUM SECONDARY BATTERY INCLUDING THE ANODE | SAMSUNG SDI CO., LTD. (KR) | 2013-01-10 | — | — | US | claimed |
| EP-2544269-A1 | Composite, method of manufacturing the composite, anode active material including the composite, anode including the anode active material, and lithium secondary battery including the anode | Samsung SDI Co., Ltd. (KR) | 2013-01-09 | — | — | EP | claimed |
| US-20100123176-A1 | SEMICONDUCTOR MEMORY DEVICE | KABUSHIKI KAISHA TOSHIBA (JP) | 2010-05-20 | — | — | US | claimed |
| EP-2166542-A1 | High dielectric insulated coax cable for sensitive impedance monitoring | GE-Hitachi Nuclear Energy Americas LLC (US) | 2010-03-24 | — | — | EP | claimed |
| US-20100067643-A1 | High dielectric insulated coax cable for sensitive impedance monitoring | GENERAL ELECTRIC COMPANY (US) | 2010-03-18 | — | — | US | claimed |
| US-20030201475-A1 | Electrodes for ferroelectric components | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-10-30 | — | — | US | claimed |
| CN-1022934-C | Semi-finished product of an electrical contact made of a composite material based on silver and tin oxides and method for the powder metallurgical production thereof | DUERRWAECHTER E DR DODUCO (DE) | 1993-12-01 | — | — | CN | claimed |
| CN-1036991-A | By silver and tin-oxide is the electric contact work in-process made of matrix material on basis and the powder metallurgy process of production thereof | DUERRWAECHTER E DR DODUCO (DE) | 1989-11-08 | — | — | CN | claimed |
| EP-0075180-B1 | HOLOGRAPHIC LIGHT GUIDE | SUMITOMO ELECTRIC INDUSTRIES LIMITED (JP) | 1989-03-08 | — | — | EP | claimed |
| US-4662711-A | BISMUTH-SILICON OR GERMANIUM OR TITANIUM-OXIDES | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 1987-05-05 | — | — | US | claimed |
| EP-0075180-A2 | Holographic light guide | SUMITOMO ELECTRIC INDUSTRIES LIMITED (JP) | 1983-03-30 | — | — | EP | claimed |