SCHEMBL11207425

SCHEMBL11207425

CCc1c(CC(C)C)ccc2ccccc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.43
ALDH1A1 P00352 3/20 0.43
KDM4E B2RXH2 3/20 0.43
MAPT P10636 3/20 0.43
GAA P10253 2/20 0.43
LMNA P02545 1/20 0.43
KMT2A Q03164 1/20 0.43
NCEH1 Q6PIU2 1/20 0.41
HSD17B10 Q99714 2/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
CYP2A6 P11509 1/20 0.38
TSHR P16473 1/20 0.38
HTR2A P28223 1/20 0.38
HTR2C P28335 1/20 0.38
GABRA1 P14867 1/20 0.37
GABRB2 P47870 1/20 0.37
TAAR1 Q96RJ0 1/20 0.37
ATM Q13315 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL271166 0.89 TDP1 (0.45) TDP1ALDH1A1KDM4EMAPTGAA
Hydrogen Sulfide SCHEMBL28084470 0.87 TDP1 (0.44) TDP1ALDH1A1KDM4EMAPTGAA
SCHEMBL248762 0.87 TDP1 (0.44) TDP1ALDH1A1KDM4EMAPTGAA
SCHEMBL248763 0.87 TDP1 (0.44) TDP1ALDH1A1KDM4EMAPTGAA
SCHEMBL11346462 0.86 ALDH1A1 (0.43) TDP1ALDH1A1KDM4EMAPTGAA
SCHEMBL103056 0.83 NCEH1 (0.50) TDP1ALDH1A1KDM4EMAPTGAA
Ammonia Solution, Strong SCHEMBL28559089 0.81 NCEH1 (0.49) TDP1ALDH1A1KDM4EMAPTGAA
Phosphine SCHEMBL28240090 0.81 NCEH1 (0.49) TDP1ALDH1A1KDM4EMAPTGAA
Hydrogen Sulfide SCHEMBL27749667 0.81 NCEH1 (0.49) TDP1ALDH1A1KDM4EMAPTGAA
Sulfuric Acid SCHEMBL11504691 0.80 SLC2A1 (0.44) TDP1ALDH1A1KDM4EMAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117263782-A Polymerizable monomer, polymer compound, resist composition, and pattern forming method 信越化学工业株式会社 2023-12-22 CN disclosed
CN-117069633-A Novel sulfonium salt, resist composition and pattern forming method 信越化学工业株式会社 2023-11-17 CN disclosed
EP-0016366-B1 METHOD FOR PREPARING MICROCAPSULES BAYER AG (DE) 1983-01-26 EP disclosed
EP-0016366-A1 Method for preparing microcapsules BAYER AG (DE) 1980-10-01 EP disclosed