SCHEMBL11224243

SCHEMBL11224243

CCCCOCCC(O)CCO

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.58
HTT P42858 2/20 0.47
THRB P10828 2/20 0.47
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
MAPT P10636 1/20 0.47
USP2 O75604 1/20 0.46
CYP3A4 P08684 2/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2C19 P33261 1/20 0.36
PLA2G2C Q5R387 1/20 0.36
LPAR5 Q9H1C0 1/20 0.35
ALDH1A1 P00352 1/20 0.35
GBA2 Q9HCG7 2/20 0.34
GBA1 P04062 1/20 0.34
PSMD14 O00487 1/20 0.33
PLA2G1B P04054 1/20 0.33
HSP90AA1 P07900 1/20 0.33
MMP2 P08253 1/20 0.33
ATG4B Q9Y4P1 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15007062 0.92 TSHR (0.58) TSHRHTTTHRBMEN1KMT2A
SCHEMBL15007063 0.87 TSHR (0.50) TSHRHTTTHRBMEN1KMT2A
SCHEMBL11890619 0.85 USP2 (0.57) TSHRHTTTHRBMEN1KMT2A
SCHEMBL10872413 0.84 THRB (0.50) TSHRTHRBMEN1KMT2AALDH1A1
SCHEMBL28094183 0.84 USP2 (0.56) TSHRHTTTHRBMEN1KMT2A
SCHEMBL15007008 0.83 TSHR (0.46) TSHRHTTTHRBMEN1KMT2A
SCHEMBL2853366 0.83 USP2 (0.60) TSHRHTTTHRBMEN1KMT2A
SCHEMBL13966358 0.83 USP2 (0.60) TSHRHTTTHRBMEN1KMT2A
SCHEMBL4201207 0.83 TSHR (0.50) TSHRHTTTHRBMEN1KMT2A
SCHEMBL12821078 0.82 HTT (0.52) TSHRHTTTHRBMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0006627-B1 RADIATION-SENSITIVE MIXTURE AND PROCESS FOR PRODUCING RELIEF IMAGES HOECHST AKTIENGESELLSCHAFT (DE) 1983-05-18 EP disclosed
US-4248957-A ENOL ETHER CONTAINING COMPOUND OF WHICH THE SOLUBILITY IN DEVELOPER INCREASES ON CLEAVAGE HOECHST AKTIENGESELLSCHAFT (DE) 1981-02-03 US disclosed
EP-0006627-A2 Radiation-sensitive mixture and process for producing relief images HOECHST AKTIENGESELLSCHAFT (DE) 1980-01-09 EP disclosed