SCHEMBL11230467

SCHEMBL11230467

Oc1ccc(OCCCCCCCCCCCCCOc2ccc(O)cc2)cc1

nearest known ligand 0.79

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR5A1 Q13285 1/20 0.79
LTA4H P09960 4/20 0.67
DRD3 P35462 2/20 0.57
DRD2 P14416 1/20 0.57
DRD4 P21917 1/20 0.57
PRMT1 Q99873 3/20 0.54
F2 P00734 2/20 0.54
ST14 Q9Y5Y6 2/20 0.54
PLAU P00749 1/20 0.54
GAA P10253 1/20 0.54
PRMT5 O14744 1/20 0.54
SLC22A2 O15244 1/20 0.54
SLC22A1 O15245 1/20 0.54
TMPRSS2 O15393 1/20 0.54
PTP4A3 O75365 1/20 0.54
SLC22A3 O75751 1/20 0.54
F10 P00742 1/20 0.54
PLG P00747 1/20 0.54
S100B P04271 1/20 0.54
CHRM2 P08172 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9128116 1.00 NR5A1 (0.79) NR5A1LTA4HDRD3DRD2DRD4
SCHEMBL8571191 1.00 NR5A1 (0.79) NR5A1LTA4HDRD3DRD2DRD4
SCHEMBL6858863 1.00 NR5A1 (0.79) NR5A1LTA4HDRD3DRD2DRD4
SCHEMBL9128336 1.00 NR5A1 (0.79) NR5A1LTA4HDRD3DRD2DRD4
SCHEMBL8571102 1.00 NR5A1 (0.79) NR5A1LTA4HDRD3DRD2DRD4
SCHEMBL16902827 1.00 NR5A1 (0.79) NR5A1LTA4HDRD3DRD2DRD4
SCHEMBL1129755 1.00 NR5A1 (0.79) NR5A1LTA4HDRD3DRD2DRD4
SCHEMBL16902828 1.00 NR5A1 (0.79) NR5A1LTA4HDRD3DRD2DRD4
SCHEMBL2470706 0.97 NR5A1 (0.75) NR5A1LTA4HDRD3DRD2DRD4
SCHEMBL2473527 0.92 LTA4H (0.68) NR5A1LTA4HDRD3DRD2DRD4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
US-4320144-A Fungicidal use of diphenyl esters of alkylenes GAF CORPORATION (US) 1982-03-16 US disclosed