SCHEMBL11245264

SCHEMBL11245264

CC1(C(=O)c2ccccc2)OC1c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.43
NPSR1 Q6W5P4 4/20 0.43
MAPT P10636 1/20 0.41
EPHX1 P07099 1/20 0.41
POLB P06746 1/20 0.40
HTT P42858 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
LMNA P02545 1/20 0.38
L3MBTL1 Q9Y468 3/20 0.37
KDM4E B2RXH2 1/20 0.36
CES2 O00748 2/20 0.35
CES1 P23141 2/20 0.35
DAO P14920 1/20 0.35
TSHR P16473 1/20 0.35
NAPRT Q6XQN6 1/20 0.35
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9793654 0.87 KMT2A (0.40) KMT2ANPSR1MAPTEPHX1POLB
SCHEMBL9004640 0.87 KMT2A (0.40) KMT2ANPSR1MAPTEPHX1POLB
SCHEMBL5860484 0.83 KMT2A (0.40) KMT2ANPSR1MAPTEPHX1POLB
SCHEMBL329169 0.83 KMT2A (0.40) KMT2ANPSR1MAPTEPHX1POLB
SCHEMBL5862723 0.83 KMT2A (0.40) KMT2ANPSR1MAPTEPHX1POLB
SCHEMBL10561225 0.82 KMT2A (0.40) KMT2ANPSR1MAPTEPHX1POLB
SCHEMBL9718644 0.79 KMT2A (0.39) KMT2ANPSR1MAPTEPHX1POLB
SCHEMBL14968052 0.77 HTT (0.45) KMT2ANPSR1MAPTPOLBHTT
SCHEMBL9718670 0.76 POLB (0.45) KMT2ANPSR1MAPTEPHX1POLB
SCHEMBL10338619 0.75 EPHX1 (0.41) KMT2ANPSR1MAPTEPHX1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4321118-A Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition CIBA-GEIGY CORPORATION (US) 1982-03-23 US disclosed
US-4318791-A PHOTOPOLYMERIZABLE SYSTEM FOR INKS CIBA-GEIGY CORPORATION (US) 1982-03-09 US disclosed
US-4315807-A Sensitizers for photopolymerization CIBA-GEIGY CORPORATION (US) 1982-02-16 US disclosed
US-4308400-A AROMATIC HYDROXY KETONES CIBA-GEIGY A.G. (CH) 1981-12-29 US disclosed
EP-0003002-A2 Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones CIBA-GEIGY AG (CH) 1979-07-11 EP disclosed