SCHEMBL11245870

SCHEMBL11245870

CC(C)c1ccc(C(=O)C(C)(C)OCO)cc1

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
USP5 P45974 1/20 0.44
CYP2C9 P11712 2/20 0.41
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41
SMN1; SMN2 Q16637 6/20 0.39
CYP2D6 P10635 1/20 0.39
HIF1A Q16665 1/20 0.39
RAB9A P51151 4/20 0.38
ALDH1A1 P00352 3/20 0.38
POLB P06746 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
NPC1 O15118 1/20 0.38
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
LMNA P02545 2/20 0.38
HTT P42858 2/20 0.38
HPGD P15428 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10709376 0.87 USP5 (0.44) USP5CYP2C9RXRARXRBSMN1; SMN2
SCHEMBL9246353 0.81 CYP2C9 (0.44) USP5CYP2C9RXRARXRBSMN1; SMN2
SCHEMBL28486290 0.79 NPC1 (0.44) SMN1; SMN2RAB9AALDH1A1L3MBTL1NPC1
SCHEMBL11078309 0.79 CES1 (0.46) SMN1; SMN2CYP2D6HIF1AALDH1A1POLB
SCHEMBL25448181 0.77 CYP2C9 (0.41) USP5CYP2C9RXRARXRBSMN1; SMN2
SCHEMBL12632153 0.76 CYP2C9 (0.50) USP5CYP2C9RXRARXRBSMN1; SMN2
SCHEMBL22660971 0.76 USP5 (0.46) USP5CYP2C9RXRARXRBSMN1; SMN2
SCHEMBL54909 0.74 CYP2C9 (0.50) USP5CYP2C9RXRARXRBSMN1; SMN2
SCHEMBL4453109 0.74 USP5 (0.47) USP5CYP2C9RXRARXRBSMN1; SMN2
SCHEMBL9819157 0.73 CYP2C9 (0.38) USP5CYP2C9RXRARXRBSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4321118-A Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition CIBA-GEIGY CORPORATION (US) 1982-03-23 US disclosed
US-4318791-A PHOTOPOLYMERIZABLE SYSTEM FOR INKS CIBA-GEIGY CORPORATION (US) 1982-03-09 US disclosed
US-4315807-A Sensitizers for photopolymerization CIBA-GEIGY CORPORATION (US) 1982-02-16 US disclosed
US-4308400-A AROMATIC HYDROXY KETONES CIBA-GEIGY A.G. (CH) 1981-12-29 US disclosed