⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15315743 | 0.84 | — | — | |
| SCHEMBL15315742 | 0.84 | — | — | |
| Acrylic Acid SCHEMBL27800102 | 0.82 | LMNA (0.34) | — | |
| SCHEMBL21372073 | 0.79 | — | — | |
| SCHEMBL21727299 | 0.75 | — | — | |
| SCHEMBL18543799 | 0.75 | — | — | |
| SCHEMBL19881557 | 0.75 | — | — | |
| SCHEMBL14671382 | 0.74 | — | — | |
| SCHEMBL13866433 | 0.74 | — | — | |
| SCHEMBL21515002 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230244145-A1 | SILICON-CONTAINING MONOMER MIXTURE, POLYSILOXANE, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PRODUCTION METHOD FOR CURED FILM, PATTERNED CURED FILM, AND PRODUCTION METHOD FOR PATTERNED CURED FILM | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-08-03 | — | — | US | disclosed |
| WO-2023008493-A1 | SILANE COMPOUND, METHOD FOR PRODUCING SAME, POLYORGANOSILOXANE COMPOUND, HARD COATING COMPOSITION, HARD COATING FILM, METHOD FOR PRODUCING SAME, AND DISPLAY | 株式会社カネカ | 2023-02-02 | — | — | WO | disclosed |
| EP-3006481-A1 | CURABLE COMPOSITION FOR SEALING OPTICAL SEMICONDUCTOR | Daicel Corporation (JP) | 2016-04-13 | — | — | EP | disclosed |
| US-4353922-A | DERIVATIVES OF 7-AZABICYCLO(2,2,1)HEPTANE | SYNTEX (U.S.A.) INC. (US) | 1982-10-12 | — | — | US | disclosed |