SCHEMBL11260692

SCHEMBL11260692

CCC1(C)CCCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12011138 0.92
SCHEMBL12011137 0.92
SCHEMBL4146119 0.92
SCHEMBL16588572 0.80
SCHEMBL25277259 0.79
SCHEMBL1054243 0.78
Hydrochloric Acid SCHEMBL21640431 0.78 LMNA (0.33)
SCHEMBL10876938 0.78
SCHEMBL23192858 0.78
SCHEMBL16369916 0.76 MAPT (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4240985-A FROM 2,2-DIALKYLTETRAHYDROPYRANS WITH ACID CATALYST ETHYL CORPORATION (US) 1980-12-23 US claimed
EP-2271622-B1 Heteroaryl derivatives as CFTR Modulators VERTEX PHARMA (US) 2017-10-04 EP disclosed
US-9296758-B2 2-quinolinyl-acetic acid derivatives as HIV antiviral compounds GILEAD SCIENCES, INC. (US) 2016-03-29 US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-20130210801-A1 2-QUINOLINYL-ACETIC ACID DERIVATIVES AS HIV ANTIVIRAL COMPOUNDS GILEAD SCIENCES, INC. (US) 2013-08-15 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed
US-4329459-A ENDOPEROXIDE CYCLOXGENASE INHIBITORS THE UPJOHN COMPANY (US) 1982-05-11 US disclosed
US-4254038-A ODORS; PERFUMES; FOR COMPLEXING SOLVENTS ETHYL CORPORATION (US) 1981-03-03 US disclosed
US-4254037-A FOR PERFUMES, ODORANTS, COMPLEXING SOLVENTS ETHYL CORPORATION (US) 1981-03-03 US disclosed
US-4240985-A FROM 2,2-DIALKYLTETRAHYDROPYRANS WITH ACID CATALYST ETHYL CORPORATION (US) 1980-12-23 US disclosed
US-4212812-A TREATING AN ALKENOL WITH A STRONG ACID TO EFFECT CYCLIZATION ETHYL CORPORATION (US) 1980-07-15 US disclosed