⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11231591 | 0.97 | — | — | |
| SCHEMBL11297895 | 0.93 | TSHR (0.31) | — | |
| SCHEMBL1127584 | 0.90 | — | — | |
| SCHEMBL17536580 | 0.83 | ALDH1A1 (0.42) | — | |
| SCHEMBL6668929 | 0.75 | ALDH1A1 (0.39) | — | |
| SCHEMBL21841454 | 0.74 | — | — | |
| SCHEMBL11172642 | 0.72 | MAPT (0.31) | — | |
| SCHEMBL1720520 | 0.69 | POLB (0.32) | — | |
| SCHEMBL3658994 | 0.69 | KCNH2 (0.38) | — | |
| SCHEMBL10796699 | 0.67 | GAA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4368314-A | POLYEPOXIDE MOLDING MATERIALS HAVING SMALL SHRINKAGE | TOAGOESI CHEMICAL INDUSTRY CO., LTD. (JP) | 1983-01-11 | — | — | US | claimed |
| EP-4738010-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME | Toray Industries, Inc. (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20260092142-A1 | RESIN COMPOSITION, CURED PRODUCT, SCINTILLATOR PANEL, AND INDUCTOR | TORAY INDUSTRIES, INC. (JP) | 2026-04-02 | — | — | US | disclosed |
| EP-4692937-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER | Toray Industries, Inc. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-12545784-B2 | Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device | TORAY INDUSTRIES, INC. (JP) | 2026-02-10 | — | — | US | disclosed |
| EP-4668018-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND SEMICONDUCTOR DEVICE USING THESE | Toray Industries, Inc. (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-12461444-B2 | Sulfonium salt, photoacid generator, curable composition, and resist composition | SAN-APRO LTD. (JP) | 2025-11-04 | — | — | US | disclosed |
| WO-2025126939-A1 | PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, SCINTILLATOR PANEL USING SAME, AND SEMICONDUCTOR DEVICE | 東レ株式会社 | 2025-06-19 | — | — | WO | disclosed |
| US-20250197634-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, AND ELECTRONIC COMPONENT USING SAME | TORAY INDUSTRIES, INC. (JP) | 2025-06-19 | — | — | US | disclosed |
| EP-3909943-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION | SAN APRO LTD (JP) | 2025-06-04 | — | — | EP | disclosed |
| US-6558871-B1 | Photopolymerization initiator comprising at least one of diaryliodonium salt | NIPPON SODA CO. LTD. (JP) | 2003-05-06 | — | — | US | disclosed |
| EP-1201638-A1 | PHOTOCURABLE COMPOSITION CONTAINING IODONIUM SALT COMPOUND | NIPPON SODA CO., LTD. (JP) | 2002-05-02 | — | — | EP | disclosed |
| EP-1106639-A1 | PHOTOCURABLE COMPOSITION CONTAINING IODONIUM SALT COMPOUND | NIPPON SODA CO., LTD. (JP) | 2001-06-13 | — | — | EP | disclosed |
| US-6166100-A | Cationically polymerizable pigmented composition | KANSAI PAINT CO., LTD. (JP) | 2000-12-26 | — | — | US | disclosed |
| EP-0751124-B1 | Sulfonium salt compound and polymerization initiator | NIPPON SODA CO (JP) | 2000-12-13 | — | — | EP | disclosed |
| US-6093753-A | CURABLE COMPOSITION COMPRISING A CATIONIC POLYMERIZABLE COMPOUND WHICH IS AN ALICYCLIC EPOXY COMPOUND OR A VINYL ETHER COMPOUND AND A CATIONIC POLYMERIZATION INITIATOR; PAINTS, ADHESIVES, INKS, PHOTORESISTS | NIPPON SODA CO., LTD. (JP) | 2000-07-25 | — | — | US | disclosed |
| US-5798396-A | HARDENING COMPOSITION; SENSITIZER AND A CATIONIC POLYMERIZABLE COMPOUND | NIPPON SODA CO., LTD. (JP) | 1998-08-25 | — | — | US | disclosed |
| EP-0846681-A1 | NOVEL SULFONIUM SALT COMPOUNDS, POLYMERIZATION INITIATOR, CURABLE COMPOSITION, AND CURING METHOD | NIPPON SODA CO., LTD. (JP) | 1998-06-10 | — | — | EP | disclosed |
| EP-0751124-A1 | SULFONIUM SALT COMPOUND AND POLYMERIZATION INITIATOR | NIPPON SODA CO., LTD. (JP) | 1997-01-02 | — | — | EP | disclosed |
| US-4368314-A | POLYEPOXIDE MOLDING MATERIALS HAVING SMALL SHRINKAGE | TOAGOESI CHEMICAL INDUSTRY CO., LTD. (JP) | 1983-01-11 | — | — | US | disclosed |