Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 5/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.36 |
| ▸ | RAB9A | P51151 | 3/20 | 0.36 |
| ▸ | NPC1 | O15118 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | HNF4A | P41235 | 1/20 | 0.35 |
| ▸ | CASP6 | P55212 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | MAOA | P21397 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | GSR | P00390 | 1/20 | 0.32 |
| ▸ | TXNRD1 | Q16881 | 1/20 | 0.32 |
| ▸ | TXNRD3 | Q86VQ6 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL638537 | 0.83 | ALDH1A1 (0.38) | CYP3A4HPRT1MEN1KMT2ARAB9A | |
| SCHEMBL6416195 | 0.76 | HPRT1 (0.50) | CYP3A4HPRT1MEN1KMT2ARAB9A | |
| SCHEMBL6419102 | 0.72 | MEN1 (0.37) | CYP3A4HPRT1MEN1KMT2ANPC1 | |
| SCHEMBL645287 | 0.72 | CYP3A4 (0.42) | CYP3A4HPRT1MEN1KMT2ARAB9A | |
| SCHEMBL15366386 | 0.69 | ALDH1A1 (0.40) | CYP3A4MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL5777939 | 0.68 | ALDH1A1 (0.47) | CYP3A4HPRT1MEN1KMT2AALDH1A1 | |
| SCHEMBL195377 | 0.68 | ALDH1A1 (0.36) | CYP3A4MEN1KMT2AALDH1A1TSHR | |
| Anthracene SCHEMBL27535343 | 0.68 | ALDH1A1 (0.61) | CYP3A4HPRT1MEN1KMT2ARAB9A | |
| SCHEMBL1127747 | 0.67 | CYP2A6 (0.43) | CYP3A4ALDH1A1TDP1MAPT | |
| SCHEMBL1128294 | 0.67 | CYP1A2 (0.43) | CYP3A4MEN1KMT2ARAB9ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0917529-A4 | CATALYST COMPOSITIONS AND PROCESSES FOR OLEFIN OLIGOMERIZATION AND POLYMERIZATION | CRYOVAC INC (US) | 2002-10-02 | — | — | EP | claimed |
| EP-0917529-A1 | CATALYST COMPOSITIONS AND PROCESSES FOR OLEFIN OLIGOMERIZATION AND POLYMERIZATION | Cryovac, Inc. (US) | 1999-05-26 | — | — | EP | claimed |
| WO-1998042665-A1 | CATALYST COMPOSITIONS AND PROCESSES FOR OLEFIN OLIGOMERIZATION AND POLYMERIZATION | CRYOVAC, INC. (US) | 1998-10-01 | — | — | WO | claimed |
| US-4224071-A | Black dyes for ball-point pen inks | AMERICAN CYANAMID COMPANY (US) | 1980-09-23 | — | — | US | claimed |
| US-20240045330-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-117420731-A | Negative photosensitive composition and pattern forming method | 东京应化工业株式会社 | 2024-01-19 | — | — | CN | disclosed |
| US-20230236505-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM | SAN-APRO LTD. (JP) | 2023-07-27 | — | — | US | disclosed |
| EP-3909943-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION | San-Apro Ltd. (JP) | 2021-11-17 | — | — | EP | disclosed |
| CN-113286781-A | Sulfonium salt, photoacid generator, curable composition, and resist composition | 三亚普罗股份有限公司 | 2021-08-20 | — | — | CN | disclosed |
| WO-2020145043-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION | サンアプロ株式会社 | 2020-07-16 | — | — | WO | disclosed |
| US-10190009-B2 | Ink composition, ink jet recording method using same, and colored material | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2019-01-29 | — | — | US | disclosed |
| US-20160160065-A1 | INK COMPOSITION, INK JET RECORDING METHOD USING SAME, AND COLORED MATERIAL | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2016-06-09 | — | — | US | disclosed |
| US-4197120-A | ELECTRICALLY PHOTOSENSITIVE PARTICLES CONTAINING COLORANT HAVING ABSORPTION MAXIMUM GREATER THAN 410 NANOMETERS | EASTMAN KODAK COMPANY (US) | 1980-04-08 | — | — | US | disclosed |
| US-RE30235-E | FOR ELECTROPHORETIC MIGRATION IMAGING PROCESSES | EASTMAN KODAK COMPANY (US) | 1980-03-18 | — | — | US | disclosed |
| US-4175961-A | DISPERSION OF A POLYMER HAVING ALKYLIDENE DIARYLENE GROUPS, A PYRYLIUM-TYPE DYE SALT, AND A BIS(N,N-DISUBSTITUTED ANILINE DERIVATIVE AS A SENSITIZER | EASTMAN KODAK COMPANY (US) | 1979-11-27 | — | — | US | disclosed |
| US-4127412-A | BIS(AMINOARYL)ALKANES | EASTMAN KODAK COMPANY (US) | 1978-11-28 | — | — | US | disclosed |
| US-4111693-A | PYRYLIUM TYPE DYE SALT | EASTMAN KODAK COMPANY (US) | 1978-09-05 | — | — | US | disclosed |
| US-4092162-A | Nitrogen containing polymers aelements | EASTMAN KODAK COMPANY (US) | 1978-05-30 | — | — | US | disclosed |
| US-4025341-A | CONDENSATION POLYMER OF A TERTIARY AROMATIC AMINE, A SENSITIZER, AND A CARBONYL COMPOUND | EASTMAN KODAK COMPANY (US) | 1977-05-24 | — | — | US | disclosed |
| US-4012376-A | Photosensitive colorant materials | EASTMAN KODAK COMPANY (US) | 1977-03-15 | — | — | US | disclosed |