SCHEMBL1131779

SCHEMBL1131779

CC(C)(CO)C(N)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20177297 0.80
SCHEMBL10780162 0.80
SCHEMBL23420013 0.78
SCHEMBL11292935 0.77 TSHR (0.30)
SCHEMBL11513534 0.76 TSHR (0.35)
SCHEMBL5885246 0.76 LMNA (0.30)
SCHEMBL11575704 0.76 GABRR1 (0.31)
SCHEMBL477841 0.75
SCHEMBL6516230 0.75
SCHEMBL140065 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250369024-A1 Acyloin Condensation Reactions, Enzymes, and Products Thereof MOJIA BIOTECH PTE LTD (SG) 2025-12-04 US disclosed
CN-114573779-A Solvent-free aqueous polyurethane dispersion applicable to high-crosslinking-density system and having high adhesive force, and preparation method and application thereof 立邦涂料(中国)有限公司 2022-06-03 CN disclosed
EP-1812381-B1 ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE SHOWA DENKO KK (JP) 2011-02-16 EP disclosed
US-7579066-B2 Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth) acrylate polymer and its use SHOWA DENKO K.K. (JP) 2009-08-25 US disclosed
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use RESONAC CORPORATION (JP) 2008-06-05 US disclosed