⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22321691 | 0.81 | LMNA (0.50) | — | |
| SCHEMBL8529658 | 0.81 | LMNA (0.50) | — | |
| SCHEMBL8356850 | 0.80 | TDP1 (0.40) | — | |
| SCHEMBL1947896 | 0.78 | — | — | |
| SCHEMBL7547718 | 0.78 | TRPV1 (0.39) | — | |
| SCHEMBL14750420 | 0.76 | TSHR (0.39) | — | |
| SCHEMBL1132477 | 0.75 | — | — | |
| SCHEMBL5234419 | 0.75 | — | — | |
| SCHEMBL5517670 | 0.75 | — | — | |
| SCHEMBL15209529 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1292305-C | Photosensitive composition and photosenpsitive lithographic printing plate | KONICA MINOLTA HOLDINGS INC (JP) | 2006-12-27 | — | — | CN | claimed |
| EP-1812381-B1 | ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE | SHOWA DENKO KK (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-7579066-B2 | Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth) acrylate polymer and its use | SHOWA DENKO K.K. (JP) | 2009-08-25 | — | — | US | disclosed |
| US-20080132597-A1 | Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use | RESONAC CORPORATION (JP) | 2008-06-05 | — | — | US | disclosed |