SCHEMBL11326640

SCHEMBL11326640

CCCCN(CCCC)c1ccc(/N=N/c2ccccc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 5/20 0.53
ALDH1A1 P00352 4/20 0.53
HSD17B10 Q99714 2/20 0.53
TSHR P16473 1/20 0.53
MAPK1 P28482 1/20 0.53
CNR2 P34972 1/20 0.45
NR1H2 P55055 2/20 0.43
NR1H3 Q13133 2/20 0.43
KDM4E B2RXH2 2/20 0.43
POLB P06746 2/20 0.43
GAA P10253 1/20 0.43
AR P10275 1/20 0.42
MEN1 O00255 5/20 0.40
KMT2A Q03164 5/20 0.40
MAPT P10636 5/20 0.40
NPC1 O15118 5/20 0.40
RAB9A P51151 5/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
LMNA P02545 2/20 0.40
PKM P14618 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11326655 1.00 TDP1 (0.53) TDP1ALDH1A1HSD17B10TSHRMAPK1
SCHEMBL16791894 0.95 ALDH1A1 (0.52) TDP1ALDH1A1HSD17B10TSHRMAPK1
SCHEMBL16791896 0.95 ALDH1A1 (0.52) TDP1ALDH1A1HSD17B10TSHRMAPK1
SCHEMBL16791941 0.93 ALDH1A1 (0.50) TDP1ALDH1A1HSD17B10TSHRMAPK1
SCHEMBL16791913 0.93 ALDH1A1 (0.50) TDP1ALDH1A1HSD17B10TSHRMAPK1
SCHEMBL16791893 0.93 ALDH1A1 (0.50) TDP1ALDH1A1HSD17B10TSHRMAPK1
SCHEMBL16791907 0.93 ALDH1A1 (0.50) TDP1ALDH1A1HSD17B10TSHRMAPK1
SCHEMBL16791892 0.93 ALDH1A1 (0.50) TDP1ALDH1A1HSD17B10TSHRMAPK1
SCHEMBL16792015 0.93 ALDH1A1 (0.50) TDP1ALDH1A1HSD17B10TSHRMAPK1
SCHEMBL16791945 0.93 ALDH1A1 (0.50) TDP1ALDH1A1HSD17B10TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4268603-A Photoresist compositions TOKYO OHKA KOGYO KABUSHIKI KAISHA (JP) 1981-05-19 US claimed
CN-108273478-B Formaldehyde removal composition and product 李怀玉 2021-03-02 CN disclosed
US-10054571-B2 Monoazo-based dye for acid detection KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (KR) 2018-08-21 US disclosed
CN-108273478-A A kind of formaldehyde removing composition and product 李怀玉 2018-07-13 CN disclosed
US-20160327529-A1 MONOAZO-BASED DYE FOR ACID DETECTION KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (KR) 2016-11-10 US disclosed
US-20160327529-A1 MONOAZO-BASED DYE FOR ACID DETECTION KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (KR) 2016-11-10 US disclosed
WO-2015088134-A1 MONOAZO-BASED DYE FOR ACID DETECTION 경북대학교 산학협력단 2015-06-18 WO disclosed
US-4268603-A Photoresist compositions TOKYO OHKA KOGYO KABUSHIKI KAISHA (JP) 1981-05-19 US disclosed