Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 7/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | GRIA4 | P48058 | 1/20 | 0.32 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.32 |
| ▸ | STS | P08842 | 2/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.31 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.31 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.31 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | FDFT1 | P37268 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5169076 | 0.81 | ALDH1A1 (0.38) | ALDH1A1TP53SMN1; SMN2HSD11B1LMNA | |
| SCHEMBL18008967 | 0.79 | NR1I2 (0.36) | KCNH2TP53NR1I2 | |
| Potassium Ion SCHEMBL18008081 | 0.79 | MAPT (0.34) | KCNH2TP53NR1I2 | |
| Potassium Ion SCHEMBL18008099 | 0.78 | MAPT (0.37) | KCNH2TP53NR1I2 | |
| SCHEMBL18008459 | 0.78 | NR1I2 (0.38) | KCNH2TP53NR1I2 | |
| Lithium Ion SCHEMBL18008126 | 0.78 | MAPT (0.37) | KCNH2TP53NR1I2 | |
| Lithium Ion SCHEMBL18008804 | 0.78 | MAPT (0.37) | KCNH2TP53NR1I2 | |
| SCHEMBL18008409 | 0.78 | NR1I2 (0.38) | KCNH2TP53NR1I2 | |
| Potassium Ion SCHEMBL18008748 | 0.78 | MAPT (0.37) | KCNH2TP53NR1I2 | |
| Lithium Ion SCHEMBL18007839 | 0.78 | MAPT (0.37) | KCNH2TP53NR1I2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2285845-B1 | LOW OUTGASSING PHOTORESIST COMPOSITIONS | IBM (US) | 2013-09-04 | — | — | EP | disclosed |
| US-7951525-B2 | Low outgassing photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-05-31 | — | — | US | disclosed |
| EP-2285845-A1 | LOW OUTGASSING PHOTORESIST COMPOSITIONS | International Business Machines Corporation (US) | 2011-02-23 | — | — | EP | disclosed |
| US-20100062368-A1 | LOW OUTGASSING PHOTORESIST COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-03-11 | — | — | US | disclosed |
| WO-2010025983-A1 | LOW OUTGASSING PHOTORESIST COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-03-11 | — | — | WO | disclosed |
| US-7479364-B2 | lithographic photoresist; deep UV, x-ray, electon beam: alpha-cyano- or an alpha-trifluoro methacrylate monomer and a vinyl ether monomer; 157 nm. | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-20 | — | — | US | disclosed |
| US-7358027-B2 | Used to generate resist images on a substrate, i.e., in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | disclosed |
| US-20080085473-A1 | lithographic photoresist; deep UV, x-ray, electon beam: alpha-cyano- or an alpha-trifluoro methacrylate monomer and a vinyl ether monomer; 157 nm. | GLOBALFOUNDRIES U.S. INC. | 2008-04-10 | — | — | US | disclosed |
| US-20030186160-A1 | Used to generate resist images on a substrate, i.e., in the manufacture of integrated circuits | GLOBALFOUNDRIES U.S. INC. | 2003-10-02 | — | — | US | disclosed |