SCHEMBL11348102

SCHEMBL11348102

C=CC(=O)OCC(O)COc1ccc(C(CC)c2ccc(OCC(O)COC(=O)C=C)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 2/20 0.46
▸ MAPT P10636 2/20 0.46
▸ LMNA P02545 1/20 0.46
▸ NPSR1 Q6W5P4 1/20 0.46
▸ CYP1A2 P05177 1/20 0.44
▸ THRB P10828 1/20 0.43
▸ PLA2G4B P0C869 1/20 0.43
▸ FFAR1 O14842 1/20 0.43
▸ SMN1; SMN2 Q16637 2/20 0.42
▸ ALDH1A1 P00352 3/20 0.41
▸ KDM4E B2RXH2 1/20 0.41
▸ MEN1 O00255 1/20 0.41
▸ KMT2A Q03164 1/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ TSHR P16473 3/20 0.41
▸ CYP2D6 P10635 1/20 0.39
▸ ABCB1 P08183 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14565943 0.88 TSHR (0.51) POLBMAPTLMNANPSR1CYP1A2
SCHEMBL21914003 0.87 POLB (0.43) POLBMAPTLMNANPSR1CYP1A2
SCHEMBL13205122 0.86 CYP1A2 (0.49) POLBMAPTLMNANPSR1CYP1A2
SCHEMBL819519 0.86 CYP1A2 (0.48) POLBMAPTLMNANPSR1CYP1A2
SCHEMBL819190 0.86 CYP1A2 (0.48) POLBMAPTLMNANPSR1CYP1A2
SCHEMBL10336222 0.86 POLB (0.44) POLBMAPTLMNANPSR1CYP1A2
SCHEMBL24571175 0.84 POLB (0.48) POLBMAPTLMNANPSR1CYP1A2
SCHEMBL28687260 0.83 THRB (0.48) THRBFFAR1SMN1; SMN2ALDH1A1MEN1
SCHEMBL2121270 0.83 POLB (0.50) POLBMAPTLMNANPSR1CYP1A2
SCHEMBL818941 0.83 CYP1A2 (0.50) POLBMAPTLMNANPSR1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117916664-A Photosensitive composition, cured product, and organic EL display device 东丽株式会社 2024-04-19 — — CN disclosed
CN-112533963-B (meth) acrylate, monomer composition for dental material, molded article, composition for dental material, and method for producing (meth) acrylate 三井化学株式会社 2023-07-25 — — CN disclosed
WO-2023127794-A1 DENTAL CURABLE COMPOSITION AND DENTAL PROSTHESIS COMPRISING BASE MATERIAL AND RESIN LAYER クラレノリタケデンタル株式会社 2023-07-06 — — WO disclosed
CN-116367806-A Curable composition for dentistry having excellent color tone adaptability 可乐丽则武齿科株式会社 2023-06-30 — — CN disclosed
CN-110785159-B Dual paste type curable dental composition 可乐丽则武齿科株式会社 2023-06-09 — — CN disclosed
CN-114828803-A Dental restorative composition 可乐丽则武齿科株式会社 2022-07-29 — — CN disclosed
CN-111093559-B Dental mill blank and method for producing same 可乐丽则武齿科株式会社 2022-07-12 — — CN disclosed
CN-113677293-A Curable composition for dental repair 可乐丽则武齿科株式会社 2021-11-19 — — CN disclosed
CN-108366910-B Dental adhesive kit 可乐丽则武齿科株式会社 2021-04-27 — — CN disclosed
CN-105722494-B Impact-modified denture base composition 登士柏国际公司 2020-11-03 — — CN disclosed
CN-111093559-A Dental mill blank and method for producing same 可乐丽则武齿科株式会社 2020-05-01 — — CN disclosed
CN-110891903-A Method for producing powder containing zirconia particles 可乐丽则武齿科株式会社 2020-03-17 — — CN disclosed
CN-110891920-A Method for manufacturing powder comprising zirconium oxide particles and fluorescent agent 可乐丽则武齿科株式会社 2020-03-17 — — CN disclosed
CN-110891921-A Zirconia sintered body containing fluorescent agent 可乐丽则武齿科株式会社 2020-03-17 — — CN disclosed
CN-110785159-A Dual paste type dental curable composition 可乐丽则武齿科株式会社 2020-02-11 — — CN disclosed
EP-3027165-A1 IMPACT MODIFIED DENTURE BASE COMPOSITIONS Dentsply International Inc. (US) 2016-06-08 — — EP disclosed
WO-2015017556-A1 IMPACT MODIFIED DENTURE BASE COMPOSITIONS DENTSPLY INTERNATIONAL INC. (US) 2015-02-05 — — WO disclosed
US-4273802-A POLYFUNCTIONAL MONOMERS CONTAINING (METH)ACRYLOYLOXY GROUPS MITSUBISHI RAYON CO., LTD. (JP) 1981-06-16 — — US disclosed
US-4273799-A POLYFUNCTIONAL MONOMERS CONTAINING (METH)ACRYLOYLOXY GROUPS MITSUBISHI RAYON CO., LTD. (JP) 1981-06-16 — — US disclosed
US-4199421-A Coating composition and a method for producing a synthetic resin molded product having an abrasion resistant surface MITSUBISHI RAYON COMPANY, LIMITED (JP) 1980-04-22 — — US disclosed
Send feedback