SCHEMBL11410023

SCHEMBL11410023

Cc1cc(Cc2cc(O)cc(C(C)(C)C)c2O)c(O)c(Cc2cc(O)cc(C(C)(C)C)c2O)c1

nearest known ligand 0.83

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 6/20 0.83
CYP2C19 P33261 5/20 0.83
HIF1A Q16665 4/20 0.83
SMN1; SMN2 Q16637 4/20 0.83
HSPA5 P11021 2/20 0.79
CYP2D6 P10635 2/20 0.68
HSD17B10 Q99714 2/20 0.68
ALDH1A1 P00352 5/20 0.53
CA2 P00918 3/20 0.53
TYR P14679 2/20 0.53
POLB P06746 1/20 0.53
AMY1A P0DUB6 1/20 0.49
TP53 P04637 2/20 0.41
CA1 P00915 2/20 0.41
CYP1A2 P05177 3/20 0.40
PTGS1 P23219 1/20 0.38
PTGS2 P35354 1/20 0.38
LMNA P02545 3/20 0.37
ALOX15 P16050 3/20 0.37
NR1I2 O75469 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL39149 0.91 CYP2C9 (1.00) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL11247674 0.91 CYP2C9 (1.00) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL29357108 0.91 CYP2C9 (1.00) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL8922833 0.91 HSPA5 (0.68) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL29415372 0.89 HSPA5 (1.00) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL34162 0.89 HSPA5 (1.00) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL29351672 0.89 HSPA5 (1.00) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL29410654 0.87 HSPA5 (0.96) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL19419897 0.84 CYP2C9 (0.86) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL8055757 0.84 CYP2C19 (0.80) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4213784-A Process for producing heat developable light-sensitive compositions and elements FUJI PHOTO FILM CO., LTD. (JP) 1980-07-22 US disclosed
US-4207112-A STORAGE STABILITY FUJI PHOTO FILM CO., LTD. (JP) 1980-06-10 US disclosed
US-4102312-A Thermally developable light-sensitive materials TOYOTA JIDOSHA KOGYO KABUSHIKI KAISHA (JP) 1978-07-25 US disclosed
US-4039334-A ORGANIC SILVER SALT AND HALIDE, REDUCING AGENT, ROSIN FUJI PHOTO FILM CO., LTD. (JA) 1977-08-02 US disclosed
US-4021249-A PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JA) 1977-05-03 US disclosed
US-4009039-A Heat developable light-sensitive oxazoline containing element FUJI PHOTO FILM CO., LTD. (JA) 1977-02-22 US disclosed
US-4003749-A Heat-developable light-sensitive materials using the reaction product of a organic silver salt an a N-halo-oxazolidinone FUJI PHOTO FILM CO., LTD. (JA) 1977-01-18 US disclosed