Acetic Acid

Acetic Acid

SCHEMBL1142260

CC(=O)[O-].CC(=O)[O-].CCO.CCO.[Pd+2]

nearest known ligand 0.61

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Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.61
TSHR P16473 3/20 0.46
ALDH1A1 P00352 2/20 0.46
CA4 P22748 2/20 0.44
TDP1 Q9NUW8 2/20 0.44
THPO P40225 1/20 0.43
FFAR3 O14843 3/20 0.42
HDAC3 O15379 2/20 0.42
HDAC1 Q13547 2/20 0.42
HDAC2 Q92769 2/20 0.42
HDAC8 Q9BY41 2/20 0.42
CES1 P23141 2/20 0.39
CES2 O00748 1/20 0.39
CYP3A4 P08684 1/20 0.36
NFKB1 P19838 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL28275679 1.00 CA1 (0.61) CA1TSHRALDH1A1CA4TDP1
Acetic Acid SCHEMBL6356170 1.00 CA1 (0.61) CA1TSHRALDH1A1CA4TDP1
Acetic Acid SCHEMBL297083 0.92 CA1 (0.61) CA1TSHRALDH1A1CA4TDP1
Acetic Acid SCHEMBL22217471 0.92 CA1 (0.61) CA1TSHRALDH1A1CA4TDP1
Acetic Acid SCHEMBL9796816 0.92
Acetic Acid SCHEMBL25381310 0.92 CA1 (0.61) CA1TSHRALDH1A1CA4TDP1
Acetic Acid SCHEMBL22217472 0.92
Acetic Acid SCHEMBL8414035 0.92
Acetic Acid SCHEMBL21489110 0.92 CA1 (0.61) CA1TSHRALDH1A1CA4TDP1
Acetic Acid SCHEMBL548946 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7884537-B2 Pattern substrate including conductive pattern of overlapping circular patterns disposed on substrate RICOH COMPANY, LTD. (JP) 2011-02-08 US disclosed
US-20080138570-A1 ELECTRON-EMITTING DEVICE AND IMAGE DISPLAY APPARATUS USING THE SAME SEKIYA TAKURO 2008-06-12 US disclosed
US-7355335-B2 Electron-emitting device and image display apparatus using the same RICOH COMPANY, LTD. (JP) 2008-04-08 US disclosed
EP-0936652-B1 Film formation method, method for fabricating electron emitting element employing the same film, and method for manufacturing image forming apparatus employing the same element CANON KK (JP) 2006-12-13 EP disclosed
US-20060028118-A1 Electron-emitting device and image display apparatus using the same SEKIYA TAKURO 2006-02-09 US disclosed
US-6992433-B2 Electron-emitting device and image display apparatus using the same RICOH COMPANY, LTD. (JP) 2006-01-31 US disclosed
US-20050202583-A1 Antistatic film forming composition, and producing method for conductive film pattern, electron source and image display apparatus CANON KABUSHIKI KAISHA (JP) 2005-09-15 US disclosed
US-6815001-B1 Electronic device, method for producing electron source and image forming device, and apparatus for producing electronic device CANON KABUSHIKI KAISHA (JP) 2004-11-09 US disclosed
US-6579139-B1 Film formation method, method for fabricating electron emitting element employing the same film, and method for manufacturing image forming apparatus employing the same element CANON KABUSHIKI KAISHA (JP) 2003-06-17 US disclosed
US-20010024227-A1 Electron-emitting device and image display apparatus using the same RICOH COMPANY, LTD. 2001-09-27 US disclosed
EP-0936652-A1 Film formation method, method for fabricating electron emitting element employing the same film, and method for manufacturing image forming apparatus employing the same element CANON KABUSHIKI KAISHA (JP) 1999-08-18 EP disclosed