Lithium Ion

Lithium Ion

SCHEMBL11432144

CCCCCCCCCCCCCCCCCCC(CC(=O)[O-])C(=O)[O-].[Li+].[Li+]

nearest known ligand 0.69

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Lithium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.69
CA1 P00915 2/20 0.52
GPR84 Q9NQS5 8/20 0.49
NFKB1 P19838 3/20 0.48
CYP3A4 P08684 2/20 0.48
TSHR P16473 2/20 0.48
NPSR1 Q6W5P4 2/20 0.48
GRIK1 P39086 1/20 0.43
GRIK2 Q13002 1/20 0.43
FFAR1 O14842 1/20 0.42
MAPT P10636 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5690631 0.96 CA2 (0.75) CA2CA1GPR84NFKB1CYP3A4
SCHEMBL27218453 0.96 CA2 (0.69) CA2CA1GPR84NFKB1CYP3A4
SCHEMBL9158148 0.96 CA2 (0.75) CA2CA1GPR84NFKB1CYP3A4
Zinc Ion SCHEMBL8623779 0.96 CA2 (0.69) CA2CA1GPR84NFKB1CYP3A4
SCHEMBL11307626 0.96 CA2 (0.69) CA2CA1GPR84NFKB1CYP3A4
SCHEMBL29176448 0.96 CA2 (0.75) CA2CA1GPR84NFKB1CYP3A4
SCHEMBL5012736 0.96 CA2 (0.75) CA2CA1GPR84NFKB1CYP3A4
SCHEMBL29053765 0.96 CA2 (0.75) CA2CA1GPR84NFKB1CYP3A4
SCHEMBL9451802 0.96 CA2 (0.69) CA2CA1GPR84NFKB1CYP3A4
SCHEMBL7704955 0.96 CA2 (0.75) CA2CA1GPR84NFKB1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4213784-A Process for producing heat developable light-sensitive compositions and elements FUJI PHOTO FILM CO., LTD. (JP) 1980-07-22 US claimed
US-4213784-A Process for producing heat developable light-sensitive compositions and elements FUJI PHOTO FILM CO., LTD. (JP) 1980-07-22 US disclosed