SCHEMBL1143379

SCHEMBL1143379

CC(C)(CC(=O)O)C(N)O.[Pd]

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.44
CHRM1 P11229 1/20 0.44
TBXA2R P21731 1/20 0.44
ADRA1A P35348 1/20 0.44
KDM4E B2RXH2 1/20 0.43
CYP2C19 P33261 2/20 0.42
HIF1A Q16665 2/20 0.42
CYP2D6 P10635 1/20 0.42
TSHR P16473 1/20 0.42
CPT2 P23786 2/20 0.38
FFAR1 O14842 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
BHMT Q93088 3/20 0.37
ACLY P53396 1/20 0.35
GABRP O00591 2/20 0.34
GABRD O14764 2/20 0.34
GABRA1 P14867 2/20 0.34
GABRB1 P18505 2/20 0.34
GABRG2 P18507 2/20 0.34
GABRB3 P28472 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27450478 0.98 HMGCR (0.46) HMGCRCHRM1TBXA2RADRA1AKDM4E
SCHEMBL1629955 0.78 HMGCR (0.46) HMGCRCHRM1TBXA2RADRA1AKDM4E
SCHEMBL28789030 0.78 HMGCR (0.46) HMGCRCHRM1TBXA2RADRA1AKDM4E
SCHEMBL26954330 0.78 HMGCR (0.46) HMGCRCHRM1TBXA2RADRA1AKDM4E
SCHEMBL11608757 0.77 HMGCR (0.50) HMGCRCHRM1TBXA2RADRA1AKDM4E
SCHEMBL4303261 0.76 ALDH1A1 (0.50) HMGCRCHRM1TBXA2RADRA1AKDM4E
SCHEMBL4200264 0.76 HMGCR (0.44) HMGCRCHRM1TBXA2RADRA1AKDM4E
SCHEMBL4303264 0.76 ALDH1A1 (0.50) HMGCRCHRM1TBXA2RADRA1AKDM4E
Hydrochloric Acid SCHEMBL27654585 0.76 KDM4E (0.48) HMGCRCHRM1TBXA2RADRA1AKDM4E
SCHEMBL20702101 0.75 HMGCR (0.48) HMGCRCHRM1TBXA2RADRA1AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8058791-B2 Electronic circuit board manufacturing apparatus and electronic circuit board RICOH COMPANY, LTD. (JP) 2011-11-15 US disclosed
US-7884537-B2 Pattern substrate including conductive pattern of overlapping circular patterns disposed on substrate RICOH COMPANY, LTD. (JP) 2011-02-08 US disclosed
US-20090151161-A1 ELECTRON-EMITTING DEVICE MANUFACTURING APPARATUS, SOLUTION INCLUDING METAL MICRO-PARTICLES, ELECTRON-EMITTING DEVICE, AND IMAGE DISPLAYING APPARATUS RICOH COMPANY, LTD., (JP) 2009-06-18 US disclosed
US-7503822-B2 Electron-emitting device manufacturing apparatus RICOH COMPANY, LTD. (JP) 2009-03-17 US disclosed
EP-0866486-B1 Method of production of electron source substrate provided with electron emitting elements and method of production of image forming apparatus using the substrate CANON KK (JP) 2009-01-14 EP disclosed
US-7442405-B2 Method for production of electron source substrate provided with electron emitting element and method for production of electronic device using the substrate CANON KABUSHIKI KAISHA (JP) 2008-10-28 US disclosed
US-20080138570-A1 ELECTRON-EMITTING DEVICE AND IMAGE DISPLAY APPARATUS USING THE SAME SEKIYA TAKURO 2008-06-12 US disclosed
US-7355335-B2 Electron-emitting device and image display apparatus using the same RICOH COMPANY, LTD. (JP) 2008-04-08 US disclosed
EP-0936652-B1 Film formation method, method for fabricating electron emitting element employing the same film, and method for manufacturing image forming apparatus employing the same element CANON KK (JP) 2006-12-13 EP disclosed
US-20060216409-A1 Film forming method and producing method for electron source substrate CANON KABUSHIKI KAISHA (JP) 2006-09-28 US disclosed
US-6514559-B1 High efficiency with less shape irregularity CANON KABUSHIKI KAISHA (JP) 2003-02-04 US disclosed
EP-0865931-B1 Production processes of printed substrate, electron-emitting element, electron source and image-forming apparatus CANON KK (JP) 2002-09-04 EP disclosed
EP-1225056-A1 Production processes of printed susbstrate, electron-emitting element, electron source and image-forming apparatus CANON KABUSHIKI KAISHA (JP) 2002-07-24 EP disclosed
US-20020015800-A1 PRODUCTION PROCESSES OF PRINTED SUBSTRATE, ELECTRON-EMITTING ELEMENT, ELECTRON SOURCE AND IMAGE-FORMING APPARATUS CANON KABUSHIKI KAISHA (JP) 2002-02-07 US disclosed
US-20010024227-A1 Electron-emitting device and image display apparatus using the same RICOH COMPANY, LTD. 2001-09-27 US disclosed
US-6220912-B1 Method and apparatus for producing electron source using dispenser to produce electron emitting portions CANON KABUSHIKI KAISHA (JP) 2001-04-24 US disclosed
US-6210245-B1 Method for producing electron source having electron emitting portions, and apparatus for producing electron source CANON KABUSHIKI KAISHA (JP) 2001-04-03 US disclosed
EP-0936652-A1 Film formation method, method for fabricating electron emitting element employing the same film, and method for manufacturing image forming apparatus employing the same element CANON KABUSHIKI KAISHA (JP) 1999-08-18 EP disclosed
EP-0866486-A2 Method for production of electron source substrate provided with electron emitting element and method for production of electronic device using the substrate CANON KABUSHIKI KAISHA (JP) 1998-09-23 EP disclosed
EP-0865931-A1 Production processes of printed substrate, electron-emitting element, electron source and image-forming apparatus CANON KABUSHIKI KAISHA (JP) 1998-09-23 EP disclosed