⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2020 | 0.94 | — | — | |
| SCHEMBL27928984 | 0.94 | TDP1 (1.00) | — | |
| SCHEMBL1332279 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL4464160 | 0.89 | — | — | |
| SCHEMBL39184 | 0.89 | — | — | |
| SCHEMBL23451826 | 0.89 | — | — | |
| SCHEMBL381805 | 0.89 | — | — | |
| Ethane SCHEMBL22032756 | 0.89 | — | — | |
| Fluoride SCHEMBL20394054 | 0.89 | TDP1 (0.89) | — | |
| SCHEMBL4800423 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3535436-B1 | PRECURSORS AND FLOWABLE CVD METHODS FOR MAKING LOW-K FILMS TO FILL SURFACE FEATURES | VERSUM MAT US LLC (US) | 2021-05-12 | — | — | EP | claimed |
| EP-3395822-B1 | ORGANOAMINOSILANES AND METHODS FOR MAKING SAME | VERSUM MAT US LLC (US) | 2020-03-25 | — | — | EP | claimed |
| CN-110722409-A | High-precision ball processing method | 浦江县承煌光电技术有限公司 | 2020-01-24 | — | — | CN | claimed |
| CN-106629759-B | A kind of synthetic method of AEL types silicoaluminophosphamolecular molecular sieves | 兰州理工大学 | 2018-10-02 | — | — | CN | claimed |
| CN-106629759-A | Synthetic method of AEL type silicoaluminophosphate molecular sieve | 兰州理工大学 | 2017-05-10 | — | — | CN | claimed |
| CN-101225511-A | Thermal etch process for cleaning CVD chambers | AIR PROD & CHEM (US) | 2008-07-23 | — | — | CN | claimed |
| US-20080142046-A1 | Thermal F2 etch process for cleaning CVD chambers | AIR PRODUCTS AND CHEMICALS, INC. | 2008-06-19 | — | — | US | claimed |
| EP-1932941-A1 | Thermal etch process for cleaning CVD chambers | Air Products and Chemicals, Inc. (US) | 2008-06-18 | — | — | EP | claimed |
| US-20250324733-A1 | SEMICONDUCTOR STRUCTURE | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2025-10-16 | — | — | US | disclosed |
| US-12402394-B2 | Semiconductor structure | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (TW) | 2025-08-26 | — | — | US | disclosed |
| CN-118184688-A | Preparation method of diisopropylamine silane | 铜陵安德科铭电子材料科技有限公司 | 2024-06-14 | — | — | CN | disclosed |
| CN-117510533-B | Preparation process and preparation system of diisopropylamine silane | 全椒亚格泰电子新材料科技有限公司 | 2024-04-05 | — | — | CN | disclosed |
| CN-117747396-A | Substrate processing apparatus, plasma generating method, method for manufacturing semiconductor device, and recording medium | 株式会社国际电气 | 2024-03-22 | — | — | CN | disclosed |
| US-20240047272-A1 | SEMICONDUCTOR STRUCTURE | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-02-08 | — | — | US | disclosed |
| US-20100055347-A1 | ACTIVATED GAS INJECTOR, FILM DEPOSITION APPARATUS, AND FILM DEPOSITION METHOD | TOKYO ELECTRON LIMITED | 2010-03-04 | — | — | US | disclosed |
| US-20090324828-A1 | FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER READABLE STORAGE MEDIUM | TOKYO ELECTRON LIMITED (JP) | 2009-12-31 | — | — | US | disclosed |
| EP-2138604-A2 | Film deposition apparatus, film deposition method, and computer readable storage medium | Tokyo Electron Limited (JP) | 2009-12-30 | — | — | EP | disclosed |
| CN-101225511-A | Thermal etch process for cleaning CVD chambers | AIR PROD & CHEM (US) | 2008-07-23 | — | — | CN | disclosed |
| US-20080142046-A1 | Thermal F2 etch process for cleaning CVD chambers | AIR PRODUCTS AND CHEMICALS, INC. | 2008-06-19 | — | — | US | disclosed |
| EP-1932941-A1 | Thermal etch process for cleaning CVD chambers | Air Products and Chemicals, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |