Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.38 |
| ▸ | TSHR | P16473 | 5/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | FFAR3 | O14843 | 2/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | LCK | P06239 | 1/20 | 0.32 |
| ▸ | FYN | P06241 | 1/20 | 0.32 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.31 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL3889216 | 1.00 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX15HSD17B10 | |
| Methacrylic Acid SCHEMBL9625264 | 1.00 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX15HSD17B10 | |
| Methacrylic Acid SCHEMBL27608049 | 0.93 | ALDH1A1 (0.33) | ALDH1A1TSHRTDP1ALOX15HSD17B10 | |
| Methacrylic Acid SCHEMBL26697259 | 0.93 | TDP1 (0.43) | ALDH1A1TSHRTDP1ALOX15HSD17B10 | |
| Bicarbonate SCHEMBL29203931 | 0.86 | ALDH1A1 (0.40) | ALDH1A1TSHRTDP1ALOX15HSD17B10 | |
| Acetic Acid SCHEMBL11750370 | 0.85 | FFAR3 (0.47) | ALDH1A1TSHRTDP1HSD17B10FFAR3 | |
| Acetic Acid SCHEMBL9815980 | 0.85 | — | — | |
| Oxalic Acid SCHEMBL27525256 | 0.85 | TSHR (0.43) | ALDH1A1TSHRTDP1ALOX15HSD17B10 | |
| Methacrylic Acid SCHEMBL10941131 | 0.83 | ALDH1A1 (0.50) | ALDH1A1TSHRTDP1ALOX15HSD17B10 | |
| Methacrylic Acid SCHEMBL22444850 | 0.83 | ALDH1A1 (0.43) | ALDH1A1TDP1ALOX15HSD17B10FFAR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 227 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107075024-A | Include the curable compositions of the EVAc containing epoxy radicals | 阿朗新科德国有限责任公司 | 2017-08-18 | — | — | CN | claimed |
| CN-101730551-B | Orientated polymeric devices | SMITH & NEPHEW, INC. (US) | 2016-01-27 | — | — | CN | claimed |
| CN-104436242-A | Composite nanometer microsphere system for medical diagnosis | CHENGDU LYUKE WOOTION TECHNOLOGY CO LTD | 2015-03-25 | — | — | CN | claimed |
| CN-104415367-A | Medical ultrasonic diagnosis contrast agent hollow composite microsphere system | CHENGDU LVKE HUATONG TECHNOLOGY CO LTD | 2015-03-18 | — | — | CN | claimed |
| CN-1955843-B | Photosensitive resin composition | DONGJIN SIMIKEN CO LTD | 2014-06-11 | — | — | CN | claimed |
| CN-101355056-B | Method for manufacturing thin film transistor substrate and photosensitive composition used in the substrate | SAMSUNG DISPLAY CO LTD | 2014-02-26 | — | — | CN | claimed |
| CN-101349867-B | Organic-inorganic compound sensitization resin composition and LCD element using sclerotium thereof | KOREA ELECTROTECH RES INST | 2012-01-25 | — | — | CN | claimed |
| CN-1900821-B | Organic-inorganic composite photosensitive resin composition | DONGJIN SEMICOHEM CO LTD | 2011-08-31 | — | — | CN | claimed |
| CN-1811597-B | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD | 2010-09-22 | — | — | CN | claimed |
| CN-1702554-B | Photosensitive resin composition | DONGJIN SIMIKEN CO LTD | 2010-08-18 | — | — | CN | claimed |
| CN-1955843-A | Photonasty resin compositon | DONGJIN SIMIKEN CO LTD (KR) | 2007-05-02 | — | — | CN | claimed |
| CN-1900821-A | Organic inorganic composite photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-01-24 | — | — | CN | claimed |
| CN-1811596-A | Light-sensitive resin composite | DONGJIN SEMICHEM CO LTD (KR) | 2006-08-02 | — | — | CN | claimed |
| CN-1811597-A | Light-sensitive resin composite | DONGJIN SEMICHEM CO LTD (KR) | 2006-08-02 | — | — | CN | claimed |
| CN-1266544-C | Photosnesitive resin composition comprising quinonediazide sulfate ester compound | DONGJIN SEMICHEM CO LTD (KR) | 2006-07-26 | — | — | CN | claimed |
| CN-1766719-A | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO LTD (KR) | 2006-05-03 | — | — | CN | claimed |
| CN-1766732-A | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO LTD (KR) | 2006-05-03 | — | — | CN | claimed |
| CN-1702554-A | Light sensitive resin composition | DONGJIN SIMIKEN CO LTD (KR) | 2005-11-30 | — | — | CN | claimed |
| CN-1568444-A | Photosnesitive resin composition comprising quinonediazide sulfate ester compound | DONGJIN SEMICHEM CO LTD (KR) | 2005-01-19 | — | — | CN | claimed |
| CN-1543591-A | Photosensitive resin composition for photoresist | 东进瑟弥侃株式会社 | 2004-11-03 | — | — | CN | claimed |