⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10634202 | 1.00 | — | — | |
| SCHEMBL10782103 | 0.96 | — | — | |
| SCHEMBL5305593 | 0.95 | ALDH1A1 (1.00) | — | |
| SCHEMBL1331977 | 0.95 | — | — | |
| SCHEMBL523 | 0.95 | — | — | |
| SCHEMBL1330344 | 0.95 | — | — | |
| SCHEMBL1331774 | 0.95 | — | — | |
| SCHEMBL9866292 | 0.95 | — | — | |
| SCHEMBL6063757 | 0.91 | — | — | |
| SCHEMBL2231343 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119998349-A | Two-component polyurethane for polycarbonate bonding | 阿科玛法国 | 2025-05-13 | — | — | CN | claimed |
| CN-102218545-B | Method for preparing nano aluminum by utilizing chemical method | DONGLIANG TAO | 2012-11-28 | — | — | CN | claimed |
| CN-102218545-A | Method for preparing nano aluminum by utilizing chemical method | DONGLIANG TAO | 2011-10-19 | — | — | CN | claimed |
| EP-0945065-B1 | CROP-SELECTIVE HERBICIDES | SANKYO CO (JP) | 2003-04-09 | — | — | EP | claimed |
| US-6200929-B1 | FOR CONTROLLING WEEDS | SANKYO COMPANY, LIMITED (JP) | 2001-03-13 | — | — | US | claimed |
| EP-0945065-A1 | CROP-SELECTIVE HERBICIDES | SANKYO COMPANY LIMITED (JP) | 1999-09-29 | — | — | EP | claimed |
| EP-4692011-A1 | TOP PLATE FOR COOKING DEVICE, PRODUCTION METHOD THEREFOR, AND METHOD FOR ASSESSING CHARRING | Nippon Electric Glass Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4667507-A1 | METHOD FOR PRODUCING THERMOPLASTIC RESIN, THERMOPLASTIC RESIN OBTAINED BY SAID PRODUCTION METHOD, AND OPTICAL LENS INCLUDING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-20250298333-A1 | POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD | Konica Minolta, Inc. (JP) | 2025-09-25 | — | — | US | disclosed |
| US-20250243388-A1 | CONDUCTIVE PASTE AND CURED PRODUCT | THREEBOND CO., LTD. (JP) | 2025-07-31 | — | — | US | disclosed |
| US-20250199203-A1 | THERMOPLASTIC RESIN AND OPTICAL MEMBER CONTAINING SAME | TEIJIN LIMITED (JP) | 2025-06-19 | — | — | US | disclosed |
| EP-3766913-B1 | POLYESTER RESIN OR POLYESTER CARBONATE RESIN, AND OPTICAL MEMBER USING SAID RESIN | TEIJIN LTD (JP) | 2025-04-30 | — | — | EP | disclosed |
| EP-4461761-A1 | COPOLYESTER RESIN | Toyobo Co., Ltd. (JP) | 2024-11-13 | — | — | EP | disclosed |
| US-5462806-A | Organosilicon containing resin; impact strength, scratch resistance | NIKON CORPORATION (JP) | 1995-10-31 | — | — | US | disclosed |
| EP-0627636-A2 | Plastic lens | NIKON CORPORATION (JP) | 1994-12-07 | — | — | EP | disclosed |
| EP-0286408-B1 | CATALYSTS FOR CATALYTIC PYROLYSIS OF PHENOL DISTILLATION RESIDUE AND PROCESS FOR RECOVERING USEFUL SUBSTANCES BY PYROLYSIS THE SAME | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1991-07-31 | — | — | EP | disclosed |
| US-4960958-A | OXIDATION, ACID CLEAVAGE | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1990-10-02 | — | — | US | disclosed |
| US-4868085-A | LOW MELTING COPOLYESTER TONER | CANON KABUSHIKI KAISHA (JP) | 1989-09-19 | — | — | US | disclosed |
| EP-0286408-A1 | Catalysts for catalytic pyrolysis of phenol distillation residue and process for recovering useful substances by pyrolysis the same | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1988-10-12 | — | — | EP | disclosed |
| US-4556605-A | WITH POLYSILOXANE HARD COATING | KABUSHIKI KAISHA SUWA SEIKOSHA (JP) | 1985-12-03 | — | — | US | disclosed |