Tetramethylammonium Ion

Tetramethylammonium Ion

SCHEMBL1146977

C[N+](C)(C)C.OB(O)OCCCC(c1cccc2ccccc12)(c1cccc2ccccc12)c1cccc2ccccc12

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACP3 P15309 2/20 0.33
HTR1B P28222 4/20 0.32
SLC6A4 P31645 2/20 0.32
HRH1 P35367 1/20 0.32
KIF11 P52732 1/20 0.32
KDM4E B2RXH2 3/20 0.31
LMNA P02545 3/20 0.31
HPGD P15428 3/20 0.31
MEN1 O00255 3/20 0.31
KMT2A Q03164 3/20 0.31
GMNN O75496 2/20 0.31
ALDH1A1 P00352 2/20 0.31
POLB P06746 2/20 0.31
MAPT P10636 2/20 0.31
MAPK1 P28482 2/20 0.31
BLM P54132 2/20 0.31
PMP22 Q01453 2/20 0.31
NPSR1 Q6W5P4 2/20 0.31
CMKLR1 Q99788 2/20 0.31
TDP1 Q9NUW8 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL624788 0.94 ACP3 (0.35) ACP3HTR1BSLC6A4HRH1KIF11
SCHEMBL31516172 0.94 ACP3 (0.35) ACP3HTR1BSLC6A4HRH1KIF11
Ammonia Solution, Strong SCHEMBL15094349 0.93 ACP3 (0.35) ACP3HTR1BSLC6A4HRH1KIF11
Tetrylammonium SCHEMBL1146621 0.92 CHRNB4 (0.36) ACP3HTR1BSLC6A4HRH1KIF11
SCHEMBL1818271 0.89 KCNA3 (0.35) ACP3HTR1BSLC6A4KIF11TDP1
Tetrabuthylammonium SCHEMBL5716017 0.88 CNR1 (0.35) HTR1BKDM4EKMT2ATDP1CYP2C9
Butylamine SCHEMBL4367320 0.86 HTR1B (0.39) HTR1BKIF11TDP1CYP2C9
Butylamine SCHEMBL4543224 0.82 HTR1B (0.37) HTR1BKIF11KDM4EKMT2ATDP1
SCHEMBL5076438 0.78 SCN8A (0.33) KDM4EMEN1KMT2AALDH1A1CYP2D6
Tetramethylammonium Ion SCHEMBL1146377 0.77 KIF11 (0.44) KIF11CYP3A4CYP2D6CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7883830-B2 Photosensitive planographic printing plate Kodak Japan Ltd. and NEC Engineering Ltd. (JP) 2011-02-08 US disclosed
US-20090233221-A1 NEGATIVE-WORKING PHOTOSENSITIVE MATERIAL AND NEGATIVE-WORKING PLANOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2009-09-17 US disclosed
EP-1708023-B1 NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE KODAK POLYCHROME GRAPHICS JP (JP) 2009-03-11 EP disclosed
US-20080280228-A1 With a photosensitive layer; a photopolymerizable compound, a copolymer undercoat layer from alkoxyvinyl silanes, polyethers, vinyl phosphoric acid, acrylic monomers KODAK GRAPHIC COMMUNICATIONS JAPAN LTD. (JP) 2008-11-13 US disclosed
EP-1865378-A1 PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE Kodak Graphic Communications Japan Ltd. (JP) 2007-12-12 EP disclosed
US-20070148582-A1 Negative photosensitive composition and negative photosensitve lithographic printing plate EASTMAN KODAK COMPANY 2007-06-28 US disclosed
EP-1708023-A1 NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE Kodak Polychrome Graphics Japan Ltd. (JP) 2006-10-04 EP disclosed