SCHEMBL1151186

SCHEMBL1151186

C=CC(=O)OC(C)COC(=O)CCC(=O)OCC(C)OC(=O)C=C

nearest known ligand 0.55

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 9/20 0.55
MAPT P10636 1/20 0.40
HPGD P15428 1/20 0.36
ALDH1A1 P00352 5/20 0.35
TP53 P04637 3/20 0.35
HIF1A Q16665 3/20 0.35
CYP3A4 P08684 2/20 0.35
HSD17B10 Q99714 1/20 0.35
LMNA P02545 1/20 0.35
PRKCA P17252 3/20 0.33
PRKCE Q02156 1/20 0.33
PRKCQ Q04759 1/20 0.33
PRKCD Q05655 1/20 0.33
MAPK1 P28482 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19845084 0.93 TSHR (0.49) TSHRMAPTHPGDALDH1A1TP53
SCHEMBL1071857 0.93 TSHR (0.49) TSHRMAPTHPGDALDH1A1TP53
SCHEMBL17696340 0.93 TSHR (0.49) TSHRMAPTHPGDALDH1A1TP53
SCHEMBL19845081 0.93 TSHR (0.49) TSHRMAPTHPGDALDH1A1TP53
SCHEMBL23647296 0.93 TSHR (0.52) TSHRMAPTALDH1A1CYP3A4LMNA
SCHEMBL7761789 0.93 TSHR (0.52) TSHRMAPTHPGDALDH1A1CYP3A4
SCHEMBL27993897 0.92 TSHR (0.47) TSHRMAPTHPGDALDH1A1TP53
SCHEMBL17693797 0.89 TSHR (0.45) TSHRMAPTHPGDALDH1A1TP53
SCHEMBL7761807 0.89 TSHR (0.55) TSHRMAPTHPGDALDH1A1TP53
SCHEMBL22143546 0.88 TSHR (0.44) TSHRMAPTHPGDALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 191 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111278879-A Curable compositions based on immiscible reactive components and block copolymers 阿科玛法国公司 2020-06-12 CN claimed
CN-102344525-A Alkali-soluble resin polymer and negative-type photosensitive resin composition comprising same LG CHEMICAL LTD 2012-02-08 CN claimed
CN-118255947-A (Meth) acrylic acid copolymer and method for producing same 日铁化学材料株式会社 2024-06-28 CN disclosed
CN-118256177-A Composition for forming adhesive layer, laminate, method for producing adhesive layer, method for producing laminate, and method for treating laminate 日铁化学材料株式会社 2024-06-28 CN disclosed
CN-118244582-A Negative photosensitive resin composition and cured film thereof 罗门哈斯电子材料韩国有限公司 2024-06-25 CN disclosed
CN-118053799-A Method for manufacturing semiconductor device 株式会社力森诺科 2024-05-17 CN disclosed
CN-113943504-B Active energy ray-curable coating agent, cured product, and laminate 荒川化学工业株式会社 2024-05-10 CN disclosed
CN-117957281-A Composition for dip molding, glove, and method for producing composition for dip molding and glove 绿安全股份有限公司 2024-04-30 CN disclosed
CN-117882174-A Temporary fixing film, temporary fixing laminate, and method for manufacturing semiconductor device 株式会社力森诺科 2024-04-12 CN disclosed
CN-113968921-B Two-stage process for processing adhesives and related compositions 艾利丹尼森公司 2024-04-05 CN disclosed
CN-115551632-B Aldehyde scavenger and resin composition 三洋化成工业株式会社 2024-04-02 CN disclosed
CN-101080674-A Composition for forming antireflection film, layered product, and method for forming resist pattern JSR CORP (JP) 2007-11-28 CN disclosed
CN-1867640-A Pigment dispersion liquid, method for producing the same, colored resin composition, color filter, and liquid crystal display MITSUBISHI CHEM CORP (JP) 2006-11-22 CN disclosed
CN-1782748-A Radiation sensitive composition for color filters, method for the preparation of the same and color liquid crystal display device JSR CORP (JP) 2006-06-07 CN disclosed
US-7019052-B1 Liquid substance mixtures and (co)-polymers, method for their production and use thereof for producing complex reactive mixtures BASF COATINGS AG (DE) 2006-03-28 US disclosed
US-20060009579-A1 Sealing composition for liquid crystal displays and process for production of liquid crystal display panels MITSUI CHEMICALS AND AND SHARP KABUSHIKI KAISHA (JP) 2006-01-12 US disclosed
CN-1720245-A Oxime ester photoinitiators with heteroaryl groups CIBA SC HOLDING AG (CH) 2006-01-11 CN disclosed
EP-0756208-B1 Resin composition for electrophotographic toner, and toner comprising it MITSUI CHEMICALS INC (JP) 2001-04-11 EP disclosed
US-6011119-A RESIN COMPOSITION SHOWS EXCELLENT CHARGING CHARACTERISTICS WITHOUT A CHARGE CONTROL AGENT; HIGH AND LOW MOLECULAR WEIGHT ADDITION POLYMERS AT LEAST ONE OF WHICH IS FROM AN UNSATURATED ANHYDRIDE AND AN ACRYLOYLOXYALKYL DICARBOXYLIC ACID ESTER MITSUI CHEMICALS, INC. (JP) 2000-01-04 US disclosed
EP-0756208-A1 Resin composition for electrophotographic toner, and toner comprising it MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1997-01-29 EP disclosed