SCHEMBL1155372

SCHEMBL1155372

C=COCCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL114377 0.72
Methylene Chloride SCHEMBL9699537 0.69
SCHEMBL753934 0.67
Butadiene SCHEMBL7754390 0.67 ALDH1A1 (0.30)
SCHEMBL6021901 0.67
SCHEMBL8088339 0.67
SCHEMBL34509 0.67
SCHEMBL253792 0.67
Vinyl Chloride SCHEMBL11779557 0.65
SCHEMBL294459 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 448 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12297343-B2 Acrylic-based copolymer composition, method for preparing the same and acrylic-based rubber composition LG CHEM, LTD. (KR) 2025-05-13 US claimed
CN-104441408-A Shell preparation method and electronic equipment LENOVO BEIJING CO LTD 2015-03-25 CN claimed
CN-203482519-U Electronic equipment LENOVO BEIJING LTD 2014-03-12 CN claimed
EP-0908473-B1 Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process SHINETSU CHEMICAL CO (JP) 2006-02-01 EP claimed
US-5364738-A Divinyl ethers, solubility in developers FUJI PHOTO FILM CO., LTD. (JP) 1994-11-15 US claimed
EP-0395432-A2 Novel polyether containing at least one 2-halomethyloxyethylene unit and 2,3-dihydroxypropyl end groups HOECHST CELANESE CORPORATION (US) 1990-10-31 EP claimed
US-4929769-A Novel polyether containing at least one 2-halomethyloxyethylene unit and 2,3-dihydroxypropyl end groups HOECHST CELANESE CORPORATION (US) 1990-05-29 US claimed
US-4113918-A ANTISTATIC, ACRYLIC POLYMER KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1978-09-12 US claimed
JP-3115240-A None JP disclosed
JP-63097606-A None JP disclosed
EP-4000840-B1 ACRYLIC RUBBER BALE EXCELLENT IN STRENGTH PROPERTIES AND PROCESSABILITY ZEON CORP (JP) 2026-03-11 EP disclosed
EP-4653500-A1 THERMOSETTING RESIN COMPOSITION AND CURED FILM Kyoeisha Chemical Co., Ltd. (JP) 2025-11-26 EP disclosed
US-12466907-B2 Acrylic rubber composition and rubber crosslinked product ZEON CORPORATION (JP) 2025-11-11 US disclosed
EP-4001315-B1 ACRYLIC RUBBER BALE EXCELLENT IN STORAGE STABILITY AND PROCESSABILITY ZEON CORP (JP) 2025-10-29 EP disclosed
CN-85109162-A Prepare method of perfluoroalkyl vinyl polymkeric substance and uses thereof 1986-10-01 CN disclosed
EP-0184081-A2 Perfluoroalkylvinyl polymer and production thereof DAIKIN INDUSTRIES, LIMITED (JP) 1986-06-11 EP disclosed
US-4293476-A POLYMER PARTICLES HAVING REACTIVE GROUPS ON SURFACES AND A COREACTIVE MONOMER THE DOW CHEMICAL COMPANY (US) 1981-10-06 US disclosed
US-4091066-A WET SPINNING, HOT STRETCHING, HEAT TREATMENT; ACRYLONITRILE POLYMER JAPAN EXLAN COMPANY LIMITED (JA) 1978-05-23 US disclosed
US-4022750-A Process for the production of a halogen-containing arcylic synthetic fiber improved in flame retardancy AMERICAN CYANAMID COMPANY (US) 1977-05-10 US disclosed
US-3974092-A COMPOUND, 6B, ORGANOALUMINUM COMPOUND, ETHER OF OLEFIN ALCOHOL CHEMISCHE WERKE HULS AKTIENGESELLSCHAFT (DT) 1976-08-10 US disclosed