SCHEMBL1155830

SCHEMBL1155830

Sc1cc(S)nc(S)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13651800 0.72
SCHEMBL13651801 0.72
SCHEMBL16405300 0.72
Trithiocyanuric Acid SCHEMBL1155854 0.69
SCHEMBL62311 0.69
SCHEMBL16105521 0.65 TRPV4 (0.33)
SCHEMBL8673331 0.65
SCHEMBL17398062 0.65
SCHEMBL11514698 0.65
SCHEMBL11740480 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3023477-B1 COMPOSITION, AND LIGHT-EMITTING ELEMENT USING SAME SUMITOMO CHEMICAL CO (JP) 2019-02-06 EP disclosed
EP-2506952-A1 ABSORBENT SOLUTION CONTAINING A BREAKDOWN INHIBITOR DERIVED FROM PYRIMIDINE OR FROM TRIAZINE AND ABSORPTION PROCESS FOR ACID COMPOUNDS CONTAINED IN A GASEOUS EFFLUENT IFP Energies nouvelles (FR) 2012-10-10 EP disclosed
WO-2011064470-A1 ABSORBENT SOLUTION CONTAINING A BREAKDOWN INHIBITOR DERIVED FROM PYRIMIDINE OR FROM TRIAZINE AND ABSORPTION PROCESS FOR ACID COMPOUNDS CONTAINED IN A GASEOUS EFFLUENT IFP Energies Nouvelles (FR) 2011-06-03 WO disclosed
US-7887998-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2011-02-15 US disclosed
US-20090246486-A1 LIGHT-TRANSMITTABLE ELECTROMAGNETIC WAVE SHIELDING FILM, PROCESS FOR PRODUCING LIGHT-TRANSMITTABLE ELECTROMAGNETIC WAVE SHIELDING FILM, FILM FOR DISPLAY PANEL, OPTICAL FILTER FOR DISPLAY PANEL AND PLASMA DISPLAY PANEL FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
EP-1333319-B1 Silver halide photographic light-sensitive material FUJIFILM CORP (JP) 2009-06-10 EP disclosed
EP-1521116-B1 Silver halide photographic light-sensitive material and package thereof FUJIFILM CORP (JP) 2009-01-21 EP disclosed
EP-1403698-B1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJIFILM CORP (JP) 2008-09-03 EP disclosed
EP-1465008-B1 Silver halide photographic light-sensitive material FUJIFILM CORP (JP) 2008-07-16 EP disclosed
US-7303851-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-12-04 US disclosed
EP-1217432-A2 Silver halide photographic light-sensitive material and method for processing the same FUJI PHOTO FILM CO., LTD. (JP) 2002-06-26 EP disclosed
US-20020018974-A1 Silver halide photographic emulsion, producing method of the same, and silver halide photographic material containing the same FUJIFILM CORPORATION (JP) 2002-02-14 US disclosed
EP-1102119-A2 Silver halide photographic material and method for processing the same FUJI PHOTO FILM CO., LTD. (JP) 2001-05-23 EP disclosed
US-6200739-B1 PREVENTING SILVER CONTAMINATION BY DEVELOPING IN THE PRESENCE OF A MERCAPTO(S)-SUBSTITUTED PYRIMIDINE OR S-TRIAZINE; CYANINE DYES; SCANNER, IMAGE SETTER, RED SEMICONDUCTOR, LASER, LED; STABILITY; CONTRAST, SENSITIVITY, HIGH DENSITY FUJI PHOTO FILM CO., LTD. (JP) 2001-03-13 US disclosed
US-6171753-B1 SUPPORT HAVING THEREON SPECTRALLY SENSITIZED LIGHT SENSITIVE SILVER HALIDE EMULSION LAYER CONTAINING AT LEAST TWO KINDS OF SILVER HALIDE EMULSIONS DIFFERENT IN THE CONCENTRATION OF A NITROGEN HETEROCYCLE CAPABLE OF FORMING COMPLEX WITH SILVER FUJI PHOTO FILM CO., LTD. (JP) 2001-01-09 US disclosed
US-6114081-A COMPRISING A SUPPORT HAVING THEREON AT LEAST ONE OF SPECTRALLY SENSITIZED LIGHT-SENSITIVE SILVER HALIDE EMULSION LAYERS, WHEREIN AT LEAST ONE OF THE SILVER HALIDE EMULSION LAYERS CONTAINS AT LEAST TWO KINDS OF SILVER HALIDE EMULSIONS FUJI PHOTO FILM CO., LTD. (JP) 2000-09-05 US disclosed
EP-0802451-B1 Silver halide photographic material and method for processing the same FUJI PHOTO FILM CO LTD (JP) 2000-07-26 EP disclosed
US-5981138-A PHOTOSENSITIVE PHOTOGRAPHIC MATERIAL CONTAINS A MESOIONIC RING CONTAINING HYDRAZINE COMPOUND; STABILITY AND EXCELLENT STORABILITY FUJI PHOTO FILM CO., LTD. (JP) 1999-11-09 US disclosed
US-5882841-A ULTRAHIGH CONTRAST, STORAGE STABILITY, UNIFORMITY, POLYMER PARTICLES CONTAINING A HYDRAZINE COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1999-03-16 US disclosed
EP-0802451-A1 Silver halide photographic material and method for processing the same FUJI PHOTO FILM CO., LTD. (JP) 1997-10-22 EP disclosed