SCHEMBL1156095

SCHEMBL1156095

Sc1cc(S)ncn1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8629974 0.78
SCHEMBL12311901 0.78
SCHEMBL9779709 0.78
SCHEMBL18167352 0.73 KMO (0.52)
SCHEMBL13411343 0.73
SCHEMBL20068733 0.73
SCHEMBL9970901 0.73
SCHEMBL8042380 0.62
SCHEMBL223049 0.61
Trithiocyanuric Acid SCHEMBL1155854 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3943491-A1 HETEROARYL DERIVATIVE, METHOD FOR PRODUCING SAME, AND PHARMACEUTICAL COMPOSITION COMPRISING SAME AS EFFECTIVE COMPONENT Voronoi Inc. (KR) 2022-01-26 EP disclosed
EP-3023477-B1 COMPOSITION, AND LIGHT-EMITTING ELEMENT USING SAME SUMITOMO CHEMICAL CO (JP) 2019-02-06 EP disclosed
EP-2895468-B1 DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING AZ ELECTRONIC MAT (LUXEMBOURG) S À R L (LU) 2017-10-25 EP disclosed
EP-2895468-A2 DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2015-07-22 EP disclosed
CN-104736523-A Developable bottom antireflective coating AZ ELECTRONIC MATERIALS LUXEMBOURG SARL 2015-06-24 CN disclosed
US-8900797-B2 Developable bottom anti-reflective coating AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2014-12-02 US disclosed
US-20140087311-A1 DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) 2014-03-27 US disclosed
US-7887998-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2011-02-15 US disclosed
US-20090069327-A1 COMPOUNDS AND COMPOSITIONS AS PROTEIN KINASE INHIBITORS IRM LLC (BM) 2009-03-12 US disclosed
US-7303851-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-12-04 US disclosed
US-20070224536-A1 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL HIRANO MITSUNORI 2007-09-27 US disclosed
EP-1445649-B1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJIFILM CORP (JP) 2007-08-22 EP disclosed
US-6645691-B1 Shape of a light-shielded light-sensitive material roll, which has a characteristic curve drawn in orthogonal coordinates of logarithm of light exposure (x-axis) and optical density (y-axis) using equal unit lengths for the both axes with FUJI PHOTO FILM CO., LTD. (JP) 2003-11-11 US disclosed
US-4036834-A ANTIBACTERIAL YAMANOUCHI PHARMACEUTICAL CO., LTD. (JA) 1977-07-19 US disclosed