SCHEMBL1156095

SCHEMBL1156095

Sc1cc(S)ncn1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12311901 0.78 — —
SCHEMBL9779709 0.78 — —
SCHEMBL8629974 0.78 — —
SCHEMBL20068733 0.73 — —
SCHEMBL9970901 0.73 — —
SCHEMBL18167352 0.73 KMO (0.52) —
SCHEMBL13411343 0.73 — —
SCHEMBL8042380 0.62 — —
SCHEMBL223049 0.61 — —
Trithiocyanuric Acid SCHEMBL1155854 0.61 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3943491-A1 HETEROARYL DERIVATIVE, METHOD FOR PRODUCING SAME, AND PHARMACEUTICAL COMPOSITION COMPRISING SAME AS EFFECTIVE COMPONENT Voronoi Inc. (KR) 2022-01-26 — — EP disclosed
EP-3023477-B1 COMPOSITION, AND LIGHT-EMITTING ELEMENT USING SAME SUMITOMO CHEMICAL CO (JP) 2019-02-06 — — EP disclosed
EP-2895468-B1 DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING AZ ELECTRONIC MAT (LUXEMBOURG) S À R L (LU) 2017-10-25 — — EP disclosed
EP-2895468-A2 DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2015-07-22 — — EP disclosed
CN-104736523-A Developable bottom antireflective coating AZ ELECTRONIC MATERIALS LUXEMBOURG SARL 2015-06-24 — — CN disclosed
US-8900797-B2 Developable bottom anti-reflective coating AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2014-12-02 — — US disclosed
US-20140087311-A1 DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) 2014-03-27 — — US disclosed
US-7887998-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2011-02-15 — — US disclosed
US-20090069327-A1 COMPOUNDS AND COMPOSITIONS AS PROTEIN KINASE INHIBITORS IRM LLC (BM) 2009-03-12 — — US disclosed
US-7303851-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
US-20070224536-A1 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL HIRANO MITSUNORI 2007-09-27 — — US disclosed
EP-1445649-B1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJIFILM CORP (JP) 2007-08-22 — — EP disclosed
US-6645691-B1 Shape of a light-shielded light-sensitive material roll, which has a characteristic curve drawn in orthogonal coordinates of logarithm of light exposure (x-axis) and optical density (y-axis) using equal unit lengths for the both axes with FUJI PHOTO FILM CO., LTD. (JP) 2003-11-11 — — US disclosed
US-4036834-A ANTIBACTERIAL YAMANOUCHI PHARMACEUTICAL CO., LTD. (JA) 1977-07-19 — — US disclosed
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