Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.58 |
| ▸ | HTR6 | P50406 | 2/20 | 0.47 |
| ▸ | TSHR | P16473 | 4/20 | 0.43 |
| ▸ | CA1 | P00915 | 2/20 | 0.43 |
| ▸ | CA2 | P00918 | 2/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA3 | P07451 | 1/20 | 0.43 |
| ▸ | CA4 | P22748 | 1/20 | 0.43 |
| ▸ | CA6 | P23280 | 1/20 | 0.43 |
| ▸ | CA5A | P35218 | 1/20 | 0.43 |
| ▸ | CA7 | P43166 | 1/20 | 0.43 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.43 |
| ▸ | CA9 | Q16790 | 1/20 | 0.43 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.43 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.43 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28915843 | 0.97 | HSD17B10 (0.55) | HSD17B10ALDH1A1TDP1HTR6TSHR | |
| SCHEMBL29078865 | 0.86 | TSHR (0.50) | HSD17B10ALDH1A1TDP1TSHRCA1 | |
| SCHEMBL3282928 | 0.79 | ALDH1A1 (0.58) | HSD17B10ALDH1A1TDP1HTR6TSHR | |
| SCHEMBL1157883 | 0.79 | ALDH1A1 (0.58) | HSD17B10ALDH1A1TDP1HTR6TSHR | |
| SCHEMBL10704793 | 0.73 | TDP1 (1.00) | HSD17B10ALDH1A1TDP1HTR6TSHR | |
| SCHEMBL18636497 | 0.73 | TDP1 (1.00) | HSD17B10ALDH1A1TDP1HTR6TSHR | |
| SCHEMBL17223 | 0.73 | TDP1 (1.00) | HSD17B10ALDH1A1TDP1HTR6TSHR | |
| SCHEMBL19153883 | 0.73 | ALDH1A1 (0.52) | HSD17B10ALDH1A1TDP1HTR6TSHR | |
| SCHEMBL20713894 | 0.73 | ALDH1A1 (0.52) | HSD17B10ALDH1A1TDP1HTR6TSHR | |
| Benzene SCHEMBL4292987 | 0.73 | TDP1 (1.00) | HSD17B10ALDH1A1TDP1HTR6TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119264025-A | Preparation method of photoacid generator for semiconductor photoresist | 苏州威迈芯材半导体有限公司 | 2025-01-07 | — | — | CN | claimed |
| CN-114736120-B | Preparation method and application of photoinitiator triphenylsulfonium salt for ArF photoresist | 安徽秀朗新材料科技有限公司 | 2024-05-14 | — | — | CN | claimed |
| CN-114736120-A | Preparation method and application of photoinitiator triphenylsulfonium salt for ArF photoresist | 安徽秀朗新材料科技有限公司 | 2022-07-12 | — | — | CN | claimed |
| CN-113548988-A | Fluorine-containing photoacid generator, and preparation method and application thereof | 安徽庆润新材料技术有限公司 | 2021-10-26 | — | — | CN | claimed |
| CN-121342713-A | Preparation method of triphenylsulfonium salt containing ketal structure and purification method of isomer thereof | 威迈芯材(合肥)半导体有限公司 | 2026-01-16 | — | — | CN | disclosed |
| CN-120623125-A | Preparation method of triphenylsulfonium sulfonamide salt | 河北圣泰材料股份有限公司 | 2025-09-12 | — | — | CN | disclosed |
| CN-119264025-A | Preparation method of photoacid generator for semiconductor photoresist | 苏州威迈芯材半导体有限公司 | 2025-01-07 | — | — | CN | disclosed |
| CN-119241596-A | Sulfur coordination manganese halogen complex, preparation method and application thereof | 南京邮电大学 | 2025-01-03 | — | — | CN | disclosed |
| CN-114736120-B | Preparation method and application of photoinitiator triphenylsulfonium salt for ArF photoresist | 安徽秀朗新材料科技有限公司 | 2024-05-14 | — | — | CN | disclosed |
| CN-114736120-B | Preparation method and application of photoinitiator triphenylsulfonium salt for ArF photoresist | 安徽秀朗新材料科技有限公司 | 2024-05-14 | — | — | CN | disclosed |
| CN-113993719-B | Trisulfide compound | 住友化学株式会社 | 2024-01-02 | — | — | CN | disclosed |
| EP-4257638-A2 | PRODUCTION METHOD FOR FLUOROPOLYMER, SURFACTANT FOR POLYMERIZATION, AND USE OF SURFACTANT | Daikin Industries, Ltd. (JP) | 2023-10-11 | — | — | EP | disclosed |
| US-7358309-B2 | core or the layer includes a composition formed from a base polymer, a crosslink initiator, and at least one additive; additive has at least one carbon-oxygen-boron linkage, carbon in the linkage being a secondary or tertiary carbon; enhances coefficient of restitution and/or reduces compression of core | ACUSHNET COMPANY (US) | 2008-04-15 | — | — | US | disclosed |
| US-7358310-B2 | Compositions for use in golf balls | ACUSHNET COMPANY (US) | 2008-04-15 | — | — | US | disclosed |
| US-7358308-B2 | Compositions for use in golf balls | ACUSHNET COMPANY (US) | 2008-04-15 | — | — | US | disclosed |
| CN-101153016-A | Method for producing 3-(substituted phenyl) sulfur onium chloride salt | BEIJING YINGLI TECHNOLOGY DEV (CN) | 2008-04-02 | — | — | CN | disclosed |
| US-20060281586-A1 | Compositions for use in golf balls | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2006-12-14 | — | — | US | disclosed |
| US-20060281587-A1 | Compositions for use in golf balls | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2006-12-14 | — | — | US | disclosed |
| US-20050245657-A1 | Compositions for use in golf balls | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2005-11-03 | — | — | US | disclosed |
| US-20050245652-A1 | Compositions for use in golf balls | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2005-11-03 | — | — | US | disclosed |