SCHEMBL1158705

SCHEMBL1158705

COC(=O)C(C)=C(c1ccccc1)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.54
CES1 P23141 3/20 0.45
CES2 O00748 2/20 0.45
SRC P12931 1/20 0.44
ESRRB O95718 2/20 0.43
CYP19A1 P11511 5/20 0.42
KMT2A Q03164 2/20 0.42
MAPT P10636 2/20 0.41
KDM4E B2RXH2 1/20 0.41
MEN1 O00255 1/20 0.41
CYP3A4 P08684 1/20 0.41
HPGD P15428 1/20 0.41
ALOX15 P16050 1/20 0.41
MAPK1 P28482 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
F2 P00734 1/20 0.41
LMNA P02545 1/20 0.41
ELANE P08246 1/20 0.41
POLB P06746 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14868118 0.85 TSHR (0.56) TSHRCES1CES2SRCCYP19A1
SCHEMBL14868116 0.85 TSHR (0.56) TSHRCES1CES2SRCCYP19A1
SCHEMBL15081529 0.85 TSHR (0.56) TSHRCES1CES2SRCCYP19A1
SCHEMBL10606385 0.83 TSHR (0.54) TSHRCES1CES2SRCESRRB
SCHEMBL28375112 0.83 TSHR (0.54) TSHRCES1CES2SRCKMT2A
SCHEMBL11744565 0.82 TSHR (0.52) TSHRCES1CES2SRCESRRB
SCHEMBL28374366 0.82 TSHR (0.52) TSHRCES1CES2SRCKMT2A
SCHEMBL24704036 0.81 TSHR (0.56) TSHRCES1CES2SRCESRRB
SCHEMBL3955105 0.80 TSHR (0.60) TSHRCES1CES2SRCKMT2A
SCHEMBL28894376 0.80 TSHR (0.60) TSHRCES1CES2SRCKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119930954-A Cationic polymer microsphere and preparation method thereof 中国科学技术大学 2025-05-06 CN claimed
CN-113667410-B Pressure Sensitive Adhesive Electrolyte 德莎欧洲股份公司 2023-11-21 CN claimed
CN-109216562-A Silicon microwire polymer complex, transparent solar cell and preparation method thereof 蔚山科学技术院 2019-01-15 CN claimed
CN-113667410-B Pressure Sensitive Adhesive Electrolyte 德莎欧洲股份公司 2023-11-21 CN disclosed
CN-112442147-B Low-viscosity 3D fluororesin and preparation method and application thereof 南京玖泰新材料科技有限公司 2023-08-29 CN disclosed
WO-2023102652-A1 COMPOUNDS ATTACHABLE TO SKIN INKBOX INK INCORPORATED (CA) 2023-06-15 WO disclosed
CN-109216562-B Silicon microwire polymer complex, transparent solar cell and preparation method thereof 蔚山科学技术院 2022-03-18 CN disclosed
US-11260360-B2 Microencapsulation ENCAPSYS, LLC 2022-03-01 US disclosed
EP-3715405-A1 FIBER-REINFORCED MOLDING MATERIAL AND MOLDED ARTICLE USING SAME DIC Corporation (JP) 2020-09-30 EP disclosed
EP-3689951-A1 PREPREG RESIN COMPOSITION, PREPREG AND MOLDED ARTICLE DIC Corporation (JP) 2020-08-05 EP disclosed
US-20200122110-A1 Microencapsulation ENCAPSYS, LLC (US) 2020-04-23 US disclosed
CN-1768286-A Optical member having protective layer, method and apparatus for producing optical member having protective layer FUJI PHOTO FILM CO LTD (JP) 2006-05-03 CN disclosed
US-20050213906-A1 Optical transmission mediums, and processes and apparatus for producing optical transmission mediums FUJIFILM CORPORATION (JP) 2005-09-29 US disclosed
EP-1507648-A2 OPTICAL TRANSMISSION MEDIUMS, AND PROCESSES AND APPARUTUS FOR PRODUCING OPTICAL TRANSMISSION MEDIUMS FUJI PHOTO FILM CO., LTD. (JP) 2005-02-23 EP disclosed
CN-1582414-A Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern JSR CORP (JP) 2005-02-16 CN disclosed
US-20030218154-A1 Optical members, compositions, methods and S-containing compounds for producing them FUJI PHOTO FILM CO., LTD. 2003-11-27 US disclosed
WO-2003097336-A2 OPTICAL TRANSMISSION MEDIUMS, AND PROCESSES AND APPARUTUS FOR PRODUCING OPTICAL TRANSMISSION MEDIUMS FUJI PHOTO FILM CO., LTD. (JP) 2003-11-27 WO disclosed
CN-1427306-A Radiation sensitive refractivity change composition and method for changing refractivity JSR CORP (JP) 2003-07-02 CN disclosed
CN-1388919-A Composition having refractive index sensitively changealbe by radiation and method for forming refractive index pattern JSR CORP (JP) 2003-01-01 CN disclosed
US-4274992-A UNSATURATED POLYESTER PPG INDUSTRIES, INC. (US) 1981-06-23 US disclosed