SCHEMBL1161817

SCHEMBL1161817

O=[Ti](=O)=O.[Fe]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL141142 0.89
SCHEMBL157797 0.80
SCHEMBL9405109 0.80
SCHEMBL15577278 0.80
SCHEMBL3796487 0.80
SCHEMBL22409534 0.73
SCHEMBL20512367 0.73
SCHEMBL20483619 0.55
SCHEMBL21808753 0.55
Oxygen SCHEMBL3197387 0.52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0836527-B1 ORGANIC POLLUTANT REMOVAL SYSTEM AND METHOD UNITED TECHNOLOGIES CORP (US) 2003-08-13 EP claimed
EP-0827555-B1 PHOTOCATALYTIC SEMICONDUCTOR COATING PROCESS UNITED TECHNOLOGIES CORP (US) 2001-03-14 EP claimed
EP-0836527-A1 ORGANIC POLLUTANT REMOVAL SYSTEM AND METHOD UNITED TECHNOLOGIES CORPORATION (US) 1998-04-22 EP claimed
EP-0827555-A1 PHOTOCATALYTIC SEMICONDUCTOR COATING PROCESS UNITED TECHNOLOGIES CORPORATION (US) 1998-03-11 EP claimed
US-5593737-A Photocatalytic semiconductor coating process UNITED TECHNOLOGIES CORPORATION (US) 1997-01-14 US claimed
WO-1996037636-A1 PHOTOCATALYTIC SEMICONDUCTOR COATING PROCESS UNITED TECHNOLOGIES CORPORATION (US) 1996-11-28 WO claimed
WO-1996037280-A1 ORGANIC POLLUTANT REMOVAL SYSTEM AND METHOD UNITED TECHNOLOGIES CORPORATION (US) 1996-11-28 WO claimed
US-12104064-B2 Active energy curable white ink composition, printing method, printing device, and printed matter RICOH COMPANY, LTD. (JP) 2024-10-01 US disclosed
CN-112351833-B Pulsating flow reactor and use thereof 味之素欧姆尼凯姆公司 2022-11-04 CN disclosed
US-20210246321-A1 ACTIVE ENERGY CURABLE WHITE INK COMPOSITION, PRINTING METHOD, PRINTING DEVICE, AND PRINTED MATTER RICOH COMPANY, LTD. (JP) 2021-08-12 US disclosed
CN-112351833-A Pulsating flow reactor and use thereof 味之素欧姆尼凯姆公司 2021-02-09 CN disclosed
CN-106444310-B Toner for developing electrostatic image and method for producing the same 柯尼卡美能达株式会社 2020-05-19 CN disclosed
US-10191400-B2 Toner for electrostatic charge image development Konica Minolta, Inc. (JP) 2019-01-29 US disclosed
US-5593737-A Photocatalytic semiconductor coating process UNITED TECHNOLOGIES CORPORATION (US) 1997-01-14 US disclosed
WO-1996037280-A1 ORGANIC POLLUTANT REMOVAL SYSTEM AND METHOD UNITED TECHNOLOGIES CORPORATION (US) 1996-11-28 WO disclosed
WO-1996037636-A1 PHOTOCATALYTIC SEMICONDUCTOR COATING PROCESS UNITED TECHNOLOGIES CORPORATION (US) 1996-11-28 WO disclosed
US-5523263-A GLASS CONTAINING IRON AND TITANIUM OXIDE; GREEN COLORED;IBFRARED AND ULTRAVIOLET RADIATION ABSORBER LIBBEY-OWENS-FORD CO. (US) 1996-06-04 US disclosed
EP-0648195-A4 GLASS COMPOSITION. LIBBEY OWENS FORD CO (US) 1996-04-17 EP disclosed
EP-0648195-A1 GLASS COMPOSITION LIBBEY-OWENS-FORD CO. (US) 1995-04-19 EP disclosed
WO-1994025407-A1 GLASS COMPOSITION LIBBEY-OWENS-FORD CO. (US) 1994-11-10 WO disclosed