Phenol

Phenol

SCHEMBL11645860

OCCc1ccc(CCO)cc1.Oc1ccccc1

nearest known ligand 0.76

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA2 P00918 2/20 0.76
▸ TDP1 Q9NUW8 3/20 0.71
▸ CA12 O43570 1/20 0.55
▸ CA1 P00915 1/20 0.55
▸ GLA P06280 1/20 0.55
▸ CA3 P07451 1/20 0.55
▸ CA4 P22748 1/20 0.55
▸ CA9 Q16790 1/20 0.55
▸ CA14 Q9ULX7 1/20 0.55
▸ ESR1 P03372 1/20 0.55
▸ ESR2 Q92731 1/20 0.55
▸ KDM4E B2RXH2 2/20 0.48
▸ ALDH1A1 P00352 2/20 0.48
▸ BACE1 P56817 2/20 0.48
▸ ALOX5 P09917 1/20 0.48
▸ GAA P10253 1/20 0.48
▸ MAPT P10636 1/20 0.48
▸ HTR1A P08908 1/20 0.46
▸ ADRA2A P08913 1/20 0.46
▸ SLC6A2 P23975 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenylethyl Alcohol SCHEMBL7607860 0.95 TDP1 (0.80) CA2TDP1CA12CA1GLA
Tyrosol SCHEMBL43838 0.87 CA2 (1.00) CA2TDP1CA12CA1CA4
Tyrosol SCHEMBL28609607 0.84 CA2 (0.94) CA2TDP1ESR1ESR2KDM4E
SCHEMBL17996039 0.84 TDP1 (0.89) CA2TDP1CA12CA1CA4
Phenylethyl Alcohol SCHEMBL1838 0.84 — —
Phenylethyl Alcohol SCHEMBL11450063 0.84 TDP1 (1.00) CA2TDP1CA1ALDH1A1TAAR1
Phenylethyl Alcohol SCHEMBL28820852 0.84 TDP1 (1.00) CA2TDP1CA1ALDH1A1TAAR1
Phenylethyl Alcohol SCHEMBL8968173 0.84 TDP1 (1.00) CA2TDP1CA1ALDH1A1TAAR1
Phenylethyl Alcohol SCHEMBL1867158 0.84 TDP1 (1.00) CA2TDP1CA1ALDH1A1TAAR1
Phenylethyl Alcohol SCHEMBL10363032 0.81 TDP1 (0.94) CA2TDP1CA1ALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4130510-A Curing of epoxy resin systems using halfester compounds containing aliphatic tertiary amino groups HITACHI CHEMICAL CO., LTD. (JP) 1978-12-19 — — US disclosed
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