SCHEMBL116503

SCHEMBL116503

C=C[SiH](C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11497334 0.97
SCHEMBL4151529 0.97
Hydrochloric Acid SCHEMBL28048019 0.97
SCHEMBL31413042 0.97
SCHEMBL14027613 0.82
SCHEMBL12599022 0.79
Dimethyl Fumarate SCHEMBL29446943 0.79 NFE2L2 (0.48)
SCHEMBL7061371 0.78
SCHEMBL13933658 0.78
SCHEMBL9341805 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 374 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12479867-B2 Processes for synthesizing unsymmetrical disiloxanes DOW SILICONES CORPORATION (US) 2025-11-25 US claimed
US-12331164-B2 Curable siloxane resin composition KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2025-06-17 US claimed
CN-118374135-B Antibacterial waterproof high polymer material for tablecloth and preparation method thereof 东莞市悠悠美居家居制造有限公司 2024-12-17 CN claimed
CN-118571973-B Gap reflective film for photovoltaic module, preparation method of gap reflective film and photovoltaic module 同享(苏州)电子材料科技股份有限公司 2024-09-24 CN claimed
CN-118571973-A Gap reflective film for photovoltaic module, preparation method of gap reflective film and photovoltaic module 同享(苏州)电子材料科技股份有限公司 2024-08-30 CN claimed
CN-118374135-A Antibacterial waterproof high polymer material for tablecloth and preparation method thereof 东莞市悠悠美居家居制造有限公司 2024-07-23 CN claimed
CN-117965023-A Puncture-resistant nylon film with high surface wetting tension and preparation method and application thereof 昆山运城塑业有限公司 2024-05-03 CN claimed
CN-117586597-B Aging-resistant polypropylene material and preparation method thereof 苏州禾昌聚合材料股份有限公司 2024-03-29 CN claimed
CN-117586597-A Aging-resistant polypropylene material and preparation method thereof 苏州禾昌聚合材料股份有限公司 2024-02-23 CN claimed
CN-117024741-A Preparation method of vinyl silicone oil 浙江恒业成新材料有限公司 2023-11-10 CN claimed
US-20070173071-A1 SiCOH dielectric INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-07-26 US claimed
EP-1716269-A2 PROCESS FOR PRODUCING SIO2-CONTAINING INSULATING LAYERS ON CHIPS Degussa GmbH (DE) 2006-11-02 EP claimed
CN-1819180-A Dielectric materialand method to make the same IBM (US) 2006-08-16 CN claimed
US-20060165891-A1 SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-07-27 US claimed
CN-1782125-A Method for forming dielectric film and dielectric film IBM (US) 2006-06-07 CN claimed
US-20060079099-A1 Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-04-13 US claimed
US-20050194619-A1 SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2005-09-08 US claimed
WO-2005080629-A2 SILICON COMPOUNDS FOR PRODUCING SiO2-CONTAINING INSULATING LAYERS ON CHIPS DEGUSSA AG (DE) 2005-09-01 WO claimed
EP-1200525-A1 CURABLE COMPOSITIONS COMPRISING THE HYDROSILYLATION PRODUCT OF OLEFINIC GROUPS-CONTAINING POLYMERS AND ORGANOSILOXANE HYDRIDES, CURED COMPOSITIONS OBTAINABLE THEREFROM, AND METHODS OF MAKING SAME 3M Innovative Properties Company (US) 2002-05-02 EP claimed
WO-2001009250-A1 CURABLE COMPOSITIONS COMPRISING THE HYDROSILYLATION PRODUCT OF OLEFINIC GROUPS-CONTAINING POLYMERS AND ORGANOSILOXANE HYDRIDES, CURED COMPOSITIONS OBTAINABLE THEREFROM, AND METHODS OF MAKING SAME 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-02-08 WO claimed