⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10266467 | 1.00 | — | — | |
| SCHEMBL19469243 | 0.97 | — | — | |
| SCHEMBL8048775 | 0.81 | ALDH1A1 (0.36) | — | |
| SCHEMBL9694230 | 0.76 | — | — | |
| SCHEMBL487298 | 0.76 | — | — | |
| SCHEMBL39952 | 0.76 | — | — | |
| SCHEMBL10973661 | 0.73 | — | — | |
| SCHEMBL12321723 | 0.73 | — | — | |
| SCHEMBL2256872 | 0.72 | — | — | |
| SCHEMBL4385577 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 965 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3714013-B1 | COMPOSITION AND METHOD FOR POLISHING MEMORY HARD DISKS EXHIBITING REDUCED SURFACE SCRATCHING | CMC MAT INC (US) | 2023-12-27 | — | — | EP | claimed |
| CN-111655809-B | Compositions and methods for polishing memory hard disks exhibiting reduced surface scratching | CMC材料股份有限公司 | 2022-05-17 | — | — | CN | claimed |
| EP-3245668-B1 | CLEANING COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR WAFERS AFTER CMP | CMC MAT INC (US) | 2021-06-30 | — | — | EP | claimed |
| EP-3714013-A2 | COMPOSITION AND METHOD FOR POLISHING MEMORY HARD DISKS EXHIBITING REDUCED SURFACE SCRATCHING | Cabot Microelectronics Corporation (US) | 2020-09-30 | — | — | EP | claimed |
| CN-111655809-A | Compositions and methods for polishing memory hard disks exhibiting reduced surface scratching | 嘉柏微电子材料股份公司 | 2020-09-11 | — | — | CN | claimed |
| US-20190153262-A1 | COMPOSITION AND METHOD FOR POLISHING MEMORY HARD DISKS EXHIBITING REDUCED SURFACE SCRATCHING | CMC MATERIALS LLC | 2019-05-23 | — | — | US | claimed |
| CN-106283097-B | Cleaning liquid composition | 易安爱富科技有限公司 | 2018-12-04 | — | — | CN | claimed |
| EP-2836480-B1 | METHOD FOR PREPARING MONO OR DIALKANOL AMIDES | CHEVRON ORONITE CO (US) | 2018-03-28 | — | — | EP | claimed |
| CN-107556208-A | The method for preparing list or di alkanolamide | 雪佛龙奥伦耐有限责任公司 | 2018-01-09 | — | — | CN | claimed |
| US-9845444-B2 | Cleaning composition after chemical mechanical polishing of organic film and cleaning method using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-12-19 | — | — | US | claimed |
| EP-0115771-B1 | Dense star polymers and a process for producing dense star polymers | DOW CHEMICAL CO (US) | 1995-03-01 | — | — | EP | claimed |
| CN-1094402-A | Antineoplastic heteronaphthoquinones | IAF BIOCHEM INT (CA) | 1994-11-02 | — | — | CN | claimed |
| EP-0533744-A1 | HETEROCYCLIC ANTHRACYCLIONE AND ANTHRACYCLINE ANALOGS | BIOCHEM PHARMA INC. (CA) | 1993-03-31 | — | — | EP | claimed |
| US-5126413-A | Cationic polyethers for electrodeposited coatings | KANSAI PAINT CO., LTD. (JP) | 1992-06-30 | — | — | US | claimed |
| WO-1991019725-A2 | HETEROCYCLIC ANTHRACYCLIONE AND ANTHRACYCLINE ANALOGS | BIOCHEM PHARMA INC. (CA) | 1991-12-26 | — | — | WO | claimed |
| EP-0444710-A2 | Coating resin composition | KANSAI PAINT CO., LTD. (JP) | 1991-09-04 | — | — | EP | claimed |
| US-4916019-A | EPOXY RESIN, NONIONIC RESIN AND BLOCKED ISOCYANATE CURING AGENT; WEATHERPROOF, ANTICORROSIVE | KANSAI PAINT CO., LTD. (JP) | 1990-04-10 | — | — | US | claimed |
| US-4666613-A | AMINO COMPOUND AS STABILIZER | COMPAGNIE FRANCAISE DE PRODUITS INDUSTRIELS (FR) | 1987-05-19 | — | — | US | claimed |
| US-4558120-A | Dense star polymer | THE DOW CHEMICAL COMPANY (US) | 1985-12-10 | — | — | US | claimed |
| US-4532047-A | Inhibiting amorphous silica scale formation by treating water with water soluble polypolar organic compound containing hydroxyl and/or primary amine groups | NALCO CHEMICAL COMPANY (US) | 1985-07-30 | — | — | US | claimed |