Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.51 |
| ▸ | RAB9A | P51151 | 3/20 | 0.50 |
| ▸ | NPC1 | O15118 | 2/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.50 |
| ▸ | PPARA | Q07869 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | PKM | P14618 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.48 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | RELA | Q04206 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.46 |
| ▸ | RECQL | P46063 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12900758 | 0.95 | KDM4E (0.48) | THRBTDP1RAB9ANPC1SMN1; SMN2 | |
| SCHEMBL11306567 | 0.95 | KDM4E (0.48) | THRBTDP1RAB9ANPC1SMN1; SMN2 | |
| SCHEMBL18219828 | 0.95 | KDM4E (0.48) | THRBTDP1RAB9ANPC1SMN1; SMN2 | |
| SCHEMBL12900759 | 0.95 | KDM4E (0.48) | THRBTDP1RAB9ANPC1SMN1; SMN2 | |
| SCHEMBL12793181 | 0.91 | HDAC1 (0.50) | RAB9ANPC1SMN1; SMN2PPARAMAPT | |
| SCHEMBL13683041 | 0.89 | TDP1 (0.44) | THRBTDP1RAB9ANPC1SMN1; SMN2 | |
| SCHEMBL16376474 | 0.89 | KDM4E (0.60) | TDP1RAB9ANPC1SMN1; SMN2ALDH1A1 | |
| SCHEMBL10050673 | 0.89 | PPARA (0.61) | RAB9ASMN1; SMN2PPARAPKMALDH1A1 | |
| SCHEMBL18104416 | 0.87 | PPARA (0.62) | PPARAPPARG | |
| SCHEMBL9891462 | 0.87 | PPARA (0.43) | THRBTDP1RAB9ANPC1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240069264-A1 | LAMINATE, REFLECTION PREVENTION SYSTEM, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| US-11820162-B2 | Pretreatment liquid, ink set, base material for image recording, method of producing base material for image recording, image recording material, and image recording method | FUJIFILM CORPORATION (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11807023-B2 | Pretreatment liquid, ink set, image recorded material, base material for image recording, method of producing base material for image recording, and image recording method | FUJIFILM CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| US-11795334-B2 | Photo-curable ink composition and method for forming image | FUJIFILM CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-20230261257-A1 | INORGANIC SOLID ELECTROLYTE-CONTAINING COMPOSITION, SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR SHEET FOR ALL-SOLID STATE SECONDARY BATTERY AND ALL-SOLID STATE SECONDARY BATTERY | FUJIFILM CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| US-20230212460-A1 | COMPOSITION FOR FORMING PHOTO-ALIGNMENT FILM, PHOTO-ALIGNMENT FILM, AND OPTICAL LAMINATE | FUJIFILM CORPORATION (JP) | 2023-07-06 | — | — | US | disclosed |
| EP-3604457-B1 | AQUEOUS INK COMPOSITION, INK SET, IMAGE FORMING METHOD, AND RESIN MICROPARTICLES FOR INK | FUJIFILM CORP (JP) | 2022-02-09 | — | — | EP | disclosed |
| WO-2020244556-A1 | METHOD FOR TREATING OR PREVENTING SACCHARIDE-RELATED DISEASES OR DISORDERS | 上海交通大学 | 2020-12-10 | — | — | WO | disclosed |
| EP-3604457-A1 | AQUEOUS INK COMPOSITION, INK SET, IMAGE FORMING METHOD, AND RESIN FINE PARTICLES FOR INKS | FUJIFILM Corporation (JP) | 2020-02-05 | — | — | EP | disclosed |
| US-20180162979-A1 | PHOTOSENSITIVE COMPOSITION, IMAGE FORMING METHOD, FILM FORMING METHOD, RESIN, IMAGE, AND FILM | FUJIFILM CORPORATION (JP) | 2018-06-14 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080193878-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-14 | — | — | US | disclosed |
| US-20080085468-A1 | microlithography; ultrafine processing of semiconductor using electron beam, X-ray or deep UV; high sensitivity, high resolution and good line edge roughness; suppression of vaporized outgas; a polystyrene with an acid-decomposable group; 10-tolyl-9-oxothioxanthenium nonafluorobutanesulfonate | FUJIFILM CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| US-20080081289-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080081292-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080076062-A1 | RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080050675-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20070224539-A1 | Resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070218406-A1 | Acid generator; exposure to actinic radiation | FUJIFILM CORPORATION (JP) | 2007-09-20 | — | — | US | disclosed |
| US-20070072121-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |