SCHEMBL13683041

SCHEMBL13683041

CCC(C)(C)C(=O)OCCOCOc1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.44
PPARA Q07869 2/20 0.43
THRB P10828 1/20 0.41
NPC1 O15118 1/20 0.40
TSHR P16473 1/20 0.40
RAB9A P51151 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
CHRM2 P08172 2/20 0.40
CHRM1 P11229 2/20 0.40
CHRM3 P20309 2/20 0.40
KDM4E B2RXH2 1/20 0.40
CHRM4 P08173 1/20 0.40
CHRM5 P08912 1/20 0.40
PPARG P37231 2/20 0.39
RECQL P46063 1/20 0.39
HDAC1 Q13547 1/20 0.39
HDAC2 Q92769 1/20 0.39
MTNR1A P48039 1/20 0.39
MTNR1B P49286 1/20 0.39
ALOX15 P16050 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683058 0.92 NPC1 (0.46) NPC1RAB9ASMN1; SMN2HDAC1HDAC2
SCHEMBL11306567 0.91 KDM4E (0.48) TDP1PPARATHRBNPC1TSHR
SCHEMBL18219828 0.91 KDM4E (0.48) TDP1PPARATHRBNPC1TSHR
SCHEMBL12900758 0.91 KDM4E (0.48) TDP1PPARATHRBNPC1TSHR
SCHEMBL12900759 0.91 KDM4E (0.48) TDP1PPARATHRBNPC1TSHR
SCHEMBL13683056 0.90 HDAC1 (0.46) KDM4EHDAC1HDAC2
SCHEMBL116844 0.89 THRB (0.51) TDP1PPARATHRBNPC1TSHR
SCHEMBL13683043 0.88 CHRNB2 (0.43) TDP1TSHRKDM4EMTNR1AMTNR1B
SCHEMBL18961212 0.88 PPARA (0.44) TDP1PPARANPC1RAB9AKDM4E
SCHEMBL13683037 0.87 MEN1 (0.47) PPARANPC1TSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20070072121-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed