⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL27447648 | 1.00 | APP (0.50) | — | |
| Fluoride SCHEMBL27460461 | 0.97 | APP (0.48) | — | |
| Fluoride SCHEMBL27813553 | 0.97 | APP (0.48) | — | |
| Fluoride SCHEMBL28021334 | 0.97 | APP (0.48) | — | |
| Fluoride SCHEMBL27590430 | 0.97 | APP (0.48) | — | |
| Fluoride SCHEMBL27883105 | 0.97 | APP (0.48) | — | |
| Hydrochloric Acid SCHEMBL28099472 | 0.97 | APP (0.48) | — | |
| Bromide SCHEMBL28848302 | 0.97 | APP (0.48) | — | |
| Fluoride SCHEMBL28255739 | 0.97 | APP (0.48) | — | |
| SCHEMBL10012319 | 0.97 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1153 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119080989-A | Resin polymer, photosensitive resin composition and application thereof | 常州强力先端电子材料有限公司 | 2024-12-06 | — | — | CN | claimed |
| CN-116027635-A | Krf film photoetching negative photoresist composition, and preparation method and application thereof | 上海新阳半导体材料股份有限公司 | 2023-04-28 | — | — | CN | claimed |
| CN-109851531-A | A kind of preparation method of acrylic acid (N- methyl perfluoro alkylsulfonamido) ethyl ester | 武汉松石科技股份有限公司 | 2019-06-07 | — | — | CN | claimed |
| CN-109790136-A | The polymer of the crosslinked group containing furans and its application | 广州华睿光电材料有限公司 | 2019-05-21 | — | — | CN | claimed |
| CN-109602906-A | The preparation method and applications of anoxic responsive type polyfunctional molecule nanoparticle | 上海纳米技术及应用国家工程研究中心有限公司 | 2019-04-12 | — | — | CN | claimed |
| CN-109577074-A | A kind of preparation method and products thereof of hydrophobic high abrasion paper pulp material | 上海纳米技术及应用国家工程研究中心有限公司 | 2019-04-05 | — | — | CN | claimed |
| CN-109432452-A | The preparation method and products thereof of oxygen sensitive type multifunctional nano probe | 上海纳米技术及应用国家工程研究中心有限公司 | 2019-03-08 | — | — | CN | claimed |
| CN-109395107-A | The preparation method and products thereof of the difunctional two-dimension nano materials of ultrasound-thermotherapy | 上海纳米技术及应用国家工程研究中心有限公司 | 2019-03-01 | — | — | CN | claimed |
| CN-107349870-B | The fluorine-containing extinguishing chemical of oil fire and liquid hydrocarbon evaporation inhibitor and the preparation method and application thereof | 华中师范大学 | 2019-01-04 | — | — | CN | claimed |
| CN-105739262-B | Electrophotography component and its production method, handle box and electronic photographing device | 佳能株式会社 | 2018-12-25 | — | — | CN | claimed |
| CN-1214292-C | Forming method for photoresist design and its laminating products | TOKYO OKA GOGYO K K (JP) | 2005-08-10 | — | — | CN | claimed |
| CN-1633628-A | Resist compositions | WAKO PURE CHEM IND LTD (JP) | 2005-06-29 | — | — | CN | claimed |
| CN-1599783-A | Flame retardant composition, process for producing the same, flame-retardant resin composition, and molded object thereof | DAICEL CHEM (JP) | 2005-03-23 | — | — | CN | claimed |
| CN-1575438-A | Photoacid generators in photoresist compositions for microlithography | DU PONT (US) | 2005-02-02 | — | — | CN | claimed |
| CN-1530171-A | Method for asymmetric hydrogenation of carboxylic ester | ˹���ػ�ѧ��Ʒ�ɷ�����˾ | 2004-09-22 | — | — | CN | claimed |
| CN-1523449-A | Pattern forming method | ���µ�����ҵ��ʽ���� | 2004-08-25 | — | — | CN | claimed |
| CN-1111538-C | Tertiary phosphanes containing alkylene clycol groups | CELANESE AG (DE) | 2003-06-18 | — | — | CN | claimed |
| CN-1424626-A | Forming method for photoresist design and its laminating products | TOKYO OKA GOGYO K K (JP) | 2003-06-18 | — | — | CN | claimed |
| CN-1274433-A | Radiation-sensitive compsn. of chemical amplification type containing onium salt type photosensitive acid generating agent | CLARIANT INT LTD (CH) | 2000-11-22 | — | — | CN | claimed |
| CN-1226251-A | Tertiary phosphines containing alkylene glycol groups | HOECHST RES & TECH GMBH & CO (DE) | 1999-08-18 | — | — | CN | claimed |