SCHEMBL11769050

SCHEMBL11769050

FN(F)C(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KCNN4 O15554 3/20 0.55
ALDH1A1 P00352 3/20 0.48
TSHR P16473 2/20 0.48
PTPN1 P18031 1/20 0.37
MAPK1 P28482 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA5A P35218 1/20 0.36
CA9 Q16790 1/20 0.36
KIF11 P52732 1/20 0.35
CYP1A2 P05177 2/20 0.33
APOBEC3G Q9HC16 1/20 0.33
TAAR1 Q96RJ0 1/20 0.33
ALOX15 P16050 1/20 0.33
ESR1 P03372 1/20 0.32
CYP3A4 P08684 1/20 0.32
ESR2 Q92731 1/20 0.32
CYP2C9 P11712 1/20 0.32
CYP2C19 P33261 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14857236 0.75 KCNN4 (0.60) KCNN4ALDH1A1TSHRPTPN1MAPK1
SCHEMBL3972409 0.74 TSHR (0.52) KCNN4ALDH1A1TSHRPTPN1MAPK1
SCHEMBL29056006 0.71 KCNN4 (0.43) KCNN4ALDH1A1TSHRPTPN1CA1
SCHEMBL30085336 0.71 KCNN4 (0.55) KCNN4ALDH1A1TSHRMAPK1CA1
SCHEMBL28100572 0.71 KCNN4 (0.55) KCNN4ALDH1A1TSHRPTPN1MAPK1
SCHEMBL23749591 0.71 KCNN4 (0.55) KCNN4ALDH1A1TSHRMAPK1CA1
SCHEMBL5921941 0.71 KCNN4 (1.00) KCNN4ALDH1A1TSHRMAPK1CYP1A2
SCHEMBL6134821 0.69 KCNN4 (0.52) KCNN4ALDH1A1TSHRPTPN1MAPK1
Trifluoromethylbenzene SCHEMBL11134163 0.69 TSHR (0.78) KCNN4ALDH1A1TSHRPTPN1MAPK1
SCHEMBL14403082 0.69 KCNN4 (0.52) KCNN4ALDH1A1TSHRPTPN1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-3992208-A Photo-sensitive etchant and method for forming metal image using same FUJI PHOTO FILM CO., LTD. (JA) 1976-11-16 US disclosed
US-3960559-A Method of making a semiconductor device utilizing a light-sensitive etching agent FUJI PHOTO FILM CO., LTD. (JA) 1976-06-01 US disclosed
US-3935117-A Photosensitive etching composition FUJI PHOTO FILM CO., LTD. (JA) 1976-01-27 US disclosed