SCHEMBL11792168

SCHEMBL11792168

CC(=O)OC(=O)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL28479235 0.97 ALDH1A1 (0.53)
SCHEMBL27944942 0.97 ALDH1A1 (0.53)
Methane SCHEMBL7757463 0.97 ALDH1A1 (0.53)
SCHEMBL28535930 0.97 ALDH1A1 (0.53)
SCHEMBL8063586 0.97 ALDH1A1 (0.53)
SCHEMBL28868462 0.97 ALDH1A1 (0.53)
SCHEMBL28200630 0.94 ALDH1A1 (0.50)
Acetic Acid SCHEMBL29208862 0.83 ALDH1A1 (0.60)
SCHEMBL3177567 0.82 ALDH1A1 (0.69)
SCHEMBL18095037 0.81 ALDH1A1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220011315-A1 NON-ENZYMATIC GLOW ASSAYS UNIVERSITY OF HOUSTON SYSTEM (US) 2022-01-13 US claimed
EP-3877753-A1 NON-ENZYMATIC GLOW ASSAYS University of Houston System (US) 2021-09-15 EP claimed
US-20200388880-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH ELECTROLYTE ADDITIVE COMPOUNDS ENEVATE CORPORATION 2020-12-10 US claimed
CN-104718292-B The microorganism of carbon dioxide fixation circulation is imported 三井化学株式会社 2019-09-10 CN claimed
CN-110072934-A Additives for controlling viscosity modification of polymers L.布吕格曼两合公司 2019-07-30 CN claimed
CN-109481964-A The preparation method of polyvinyl chloride oil suction fibre film 南京航空航天大学溧水仿生产业研究院有限公司 2019-03-19 CN claimed
CN-107281098-A A kind of hemofiltration replacement liquid 华仁药业股份有限公司 2017-10-24 CN claimed
CN-102318042-B Polishing agent for polishing copper and polishing method using same HITACHI CHEMICAL CO LTD 2015-07-01 CN claimed
CN-102834479-B Polishing agent for polishing copper and polishing method using the same HITACHI CHEMICAL CO LTD 2015-02-18 CN claimed
CN-102690605-B Polishing agent for copper polishing and polishing method using same HITACHI CHEMICAL CO LTD 2015-01-21 CN claimed
CN-102703027-A Use of polishing agent for polishing copper HITACHI CHEMICAL CO LTD 2012-10-03 CN claimed
CN-102690605-A Polishing agent for copper polishing and polishing method using same HITACHI CHEMICAL CO LTD 2012-09-26 CN claimed
US-20260092924-A1 NON-ENZYMATIC GLOW ASSAYS UNIVERSITY OF HOUSTON SYSTEM (US) 2026-04-02 US disclosed
EP-3877753-B1 NON-ENZYMATIC GLOW ASSAYS UNIV HOUSTON SYSTEM (US) 2025-10-08 EP disclosed
EP-4437319-A1 METHODS AND COMPOSITIONS FOR ANALYTE QUANTIFICATION Matterworks Inc (US) 2024-10-02 EP disclosed
US-11742519-B2 Silicon-based energy storage devices with electrolyte additive compounds ENEVATE CORPORATION (US) 2023-08-29 US disclosed
CN-101188314-A Ionic compound, electrolytic solution, electrochemical device, and battery SONY CORP (JP) 2008-05-28 CN disclosed
CN-1890087-A black steel plate JFE STEEL KK (JP) 2007-01-03 CN disclosed
CN-1820076-A Process for producing organic acid MITSUBISHI CHEM CORP (JP) 2006-08-16 CN disclosed
US-4005130-A Preparation of oxalate esters from carbon monoxide and alcohol over a metal catalyst and a dione oxidant ATLANTIC RICHFIELD COMPANY (US) 1977-01-25 US disclosed