SCHEMBL11823906

SCHEMBL11823906

CC(O)C#CC#CC(C)O

nearest known ligand 0.39

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.39
TP53 P04637 1/20 0.35
CACNA2D1 P54289 1/20 0.32
CACNB2 Q08289 1/20 0.32
CACNA1C Q13936 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4626999 0.87
SCHEMBL13154417 0.84
SCHEMBL66883 0.82
SCHEMBL11422398 0.78 ALDH1A1 (0.32) ALDH1A1
SCHEMBL751928 0.72
SCHEMBL148913 0.72
SCHEMBL12590720 0.72
SCHEMBL681648 0.72
SCHEMBL614606 0.72
SCHEMBL4929816 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9163307-B2 Three-dimensional photoresists via functionalization of polymer thin films fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2015-10-20 US claimed
US-20130260054-A1 Three-Dimensional Photoresists via Functionalization of Polymer Thin Films Fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 US claimed
WO-2013148126-A1 THREE-DIMENSIONAL PHOTORESISTS VIA FUNCTIONALIZATION OF POLYMER THIN FILMS FABRICATED BY ICVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 WO claimed
US-9163307-B2 Three-dimensional photoresists via functionalization of polymer thin films fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2015-10-20 US disclosed
US-20130260054-A1 Three-Dimensional Photoresists via Functionalization of Polymer Thin Films Fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 US disclosed
WO-2013148126-A1 THREE-DIMENSIONAL PHOTORESISTS VIA FUNCTIONALIZATION OF POLYMER THIN FILMS FABRICATED BY ICVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 WO disclosed
US-3995054-A MITICIDES ZOECON CORPORATION (US) 1976-11-30 US disclosed