Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | HPGD | P15428 | 3/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 2/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | AR | P10275 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10385367 | 1.00 | MAPT (0.39) | MAPTL3MBTL1ALDH1A1HPGDTDP1 | |
| SCHEMBL5665263 | 0.95 | MAPT (0.43) | MAPTL3MBTL1ALDH1A1HPGDTDP1 | |
| SCHEMBL11063706 | 0.94 | MAPT (0.42) | MAPTL3MBTL1ALDH1A1HPGDTDP1 | |
| Zinc Ion SCHEMBL11063710 | 0.94 | MAPT (0.42) | MAPTL3MBTL1ALDH1A1HPGDTDP1 | |
| Hydrochloric Acid SCHEMBL9464793 | 0.94 | MAPT (0.42) | MAPTL3MBTL1ALDH1A1HPGDTDP1 | |
| Hydrochloric Acid SCHEMBL8082567 | 0.92 | MAPT (0.44) | MAPTL3MBTL1ALDH1A1HPGDTDP1 | |
| Hydrochloric Acid SCHEMBL11359417 | 0.92 | MAPT (0.41) | MAPTL3MBTL1ALDH1A1HPGDTDP1 | |
| Hydrochloric Acid SCHEMBL11147802 | 0.92 | MAPT (0.41) | MAPTL3MBTL1ALDH1A1HPGDTDP1 | |
| Hydrochloric Acid SCHEMBL11147817 | 0.92 | MAPT (0.41) | MAPTL3MBTL1ALDH1A1HPGDTDP1 | |
| Hydrochloric Acid SCHEMBL11359415 | 0.91 | MAPT (0.43) | MAPTL3MBTL1ALDH1A1HPGDTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4205989-A | Dry system image producing element | KIMOTO & CO., LTD. (JP) | 1980-06-03 | — | — | US | claimed |
| JP-8060054-A | — | — | None | — | — | JP | disclosed |
| EP-3137310-B1 | A SECURITY DEVICE COMPONENT, A SECURITY DEVICE AND AN OBJECT OF VALUE | DE LA RUE INT LTD (GB) | 2019-11-13 | — | — | EP | disclosed |
| EP-2760920-B1 | A PROCESS FOR CURING A COMPOSITION BY ELECTRON BEAM RADIATION, AND BY GAS-GENERATED PLASMA AND ULTRAVIOLET RADIATION | IDEON LLC (US) | 2018-01-24 | — | — | EP | disclosed |
| EP-3137310-A2 | SECURITY DEVICE COMPONENTS AND METHODS OF MANUFACTURE THEREOF | De La Rue International Limited (GB) | 2017-03-08 | — | — | EP | disclosed |
| US-20170043609-A1 | SECURITY DEVICE COMPONENTS AND METHODS OF MANUFACTURE THEREOF | DE LA RUE INTERNATIONAL LIMITED (GB) | 2017-02-16 | — | — | US | disclosed |
| US-9011983-B2 | Process for curing a composition by electron beam radiation, and by gas-generated plasma and ultraviolet radiation | IDEON LLC (US) | 2015-04-21 | — | — | US | disclosed |
| EP-2760920-A2 | A PROCESS FOR CURING A COMPOSITION BY ELECTRON BEAM RADIATION, AND BY GAS-GENERATED PLASMA AND ULTRAVIOLET RADIATION | Ideon LLC (US) | 2014-08-06 | — | — | EP | disclosed |
| WO-2013019555-A2 | A PROCESS FOR CURING A COMPOSITION BY ELECTRON BEAM RADIATION, AND BY GAS-GENERATED PLASMA AND ULTRAVIOLET RADIATION | IDEON LLC (US) | 2013-02-07 | — | — | WO | disclosed |
| US-20130029057-A1 | PROCESS FOR CURING A COMPOSITION BY ELECTRON BEAM RADIATION, AND BY GAS-GENERATED PLASMA AND ULTRAVIOLET RADIATION | METALLIZED SURFACE TECHNOLOGIES, LLC | 2013-01-31 | — | — | US | disclosed |
| EP-0300326-A1 | Hydroxypolyimides and high temperature resistant positive photoresists | HOECHST CELANESE CORPORATION (US) | 1989-01-25 | — | — | EP | disclosed |
| US-4678737-A | Radiation-sensitive composition and recording material based on compounds which can be split by acid | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-07-07 | — | — | US | disclosed |
| EP-0056226-B1 | TWO-COMPONENT DIAZOTYPE MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-03-20 | — | — | EP | disclosed |
| US-4492749-A | PHOTOSTABILITY | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-01-08 | — | — | US | disclosed |
| EP-0056226-A1 | Two-component diazotype material | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-07-21 | — | — | EP | disclosed |
| US-4252592-A | Method of making epoxide resin-impregnated composites | CIBA-GEIGY CORPORATION (US) | 1981-02-24 | — | — | US | disclosed |
| EP-0017699-A1 | Derivatives of 2-hydroxy-naphthalene and diazo photographic material containing them as coupling components | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-10-29 | — | — | EP | disclosed |
| US-4218279-A | Bonding method employing film adhesives containing an epoxide resin | CIBA-GEIGY CORPORATION (US) | 1980-08-19 | — | — | US | disclosed |
| US-4205989-A | Dry system image producing element | KIMOTO & CO., LTD. (JP) | 1980-06-03 | — | — | US | disclosed |
| US-4163672-A | DIRECT POSITIVES, PHOTORESISTS, PRINTING PLATES, SHELF LIFE | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-08-07 | — | — | US | disclosed |