⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3418287 | 0.82 | — | — | |
| SCHEMBL38517 | 0.82 | — | — | |
| SCHEMBL30596277 | 0.82 | — | — | |
| SCHEMBL6757709 | 0.82 | — | — | |
| SCHEMBL8361587 | 0.82 | — | — | |
| SCHEMBL3416083 | 0.82 | — | — | |
| SCHEMBL27918744 | 0.82 | — | — | |
| SCHEMBL31299184 | 0.82 | — | — | |
| SCHEMBL22261429 | 0.67 | — | — | |
| SCHEMBL2709874 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3231548-B1 | METHODS OF BRAZING WIDE GAPS IN NICKEL BASE SUPERALLOYS WITHOUT SUBSTANTIAL DEGRADATION OF PROPERTIES | SIEMENS ENERGY INC (US) | 2020-08-19 | — | — | EP | disclosed |
| CN-107414224-B | Method of brazing wide gaps in nickel-based superalloys without significant degradation of properties | 西门子能源有限公司 | 2020-04-14 | — | — | CN | disclosed |
| US-9839980-B2 | Methods of brazing wide gaps in nickel base superalloys without substantial degradation of properties | SIEMENS ENERGY, INC. (US) | 2017-12-12 | — | — | US | disclosed |
| CN-107414224-A | The method of broad gap in solder brazing nickel-based superalloy without notable degradation characteristic | 西门子能源有限公司 | 2017-12-01 | — | — | CN | disclosed |
| US-20170297147-A1 | METHODS OF BRAZING WIDE GAPS IN NICKEL BASE SUPERALLOYS WITHOUT SUBSTANTIAL DEGREDATION OF PROPERTIES | SIEMENS ENERGY, INC. | 2017-10-19 | — | — | US | disclosed |
| EP-3231548-A1 | METHODS OF BRAZING WIDE GAPS IN NICKEL BASE SUPERALLOYS WITHOUT SUBSTANTIAL DEGREDATION OF PROPERTIES | Siemens Energy, Inc. (US) | 2017-10-18 | — | — | EP | disclosed |
| US-9659758-B2 | Coils utilized in vapor deposition applications and methods of production | HONEYWELL INTERNATIONAL INC. (US) | 2017-05-23 | — | — | US | disclosed |
| US-9279178-B2 | Manufacturing design and processing methods and apparatus for sputtering targets | HONEYWELL INTERNATIONAL INC. (US) | 2016-03-08 | — | — | US | disclosed |
| US-8702919-B2 | Target designs and related methods for coupled target assemblies, methods of production and uses thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-04-22 | — | — | US | disclosed |
| US-8398833-B2 | Use of DC magnetron sputtering systems | HONEYWELL INTERNATIONAL INC. (US) | 2013-03-19 | — | — | US | disclosed |
| EP-1583852-A2 | TARGET DESIGNS AND RELATED METHODS FOR ENHANCED COOLING AND REDUCED DEFLECTION AND DEFORMATION | Honeywell International, Inc. (US) | 2005-10-12 | — | — | EP | disclosed |
| WO-2004032184-A9 | LOW TEMPERATURE SALICIDE FORMING MATERIALS AND SPUTTERING TARGETS FORMED THEREFROM | HONEYWELL INT INC (US) | 2004-10-21 | — | — | WO | disclosed |
| WO-2004066360-A2 | APPARATUS AND METHODS FOR IONIZED DEPOSITION OF A FILM OR THIN LAYER | HONEYWELL INTERNATIONAL INC (US) | 2004-08-05 | — | — | WO | disclosed |
| WO-2004024979-A9 | SENSOR SYSTEM AND METHODS USED TO DETECT MATERIAL WEAR AND SURFACE DETERIORATION | HONEYWELL INT INC (US) | 2004-07-15 | — | — | WO | disclosed |
| US-20040104110-A1 | Topologically tailored sputtering targets | LEE EAL H (US) | 2004-06-03 | — | — | US | disclosed |
| WO-2004038059-A2 | TARGET DESIGNS AND RELATED METHODS FOR ENHANCED COOLING AND REDUCED DEFLECTION AND DEFORMATION | HONEYWELL INTERNATIONAL INC (US) | 2004-05-06 | — | — | WO | disclosed |
| WO-2004032184-A2 | LOW TEMPERATURE SALICIDE FORMING MATERIALS AND SPUTTERING TARGETS FORMED THEREFROM | HONEYWELL INTERNATIONAL, INC. (US) | 2004-04-15 | — | — | WO | disclosed |
| WO-2004024979-A1 | SENSOR SYSTEM AND METHODS USED TO DETECT MATERIAL WEAR AND SURFACE DETERIORATION | HONEYWELL INTERNATIONAL INC. (US) | 2004-03-25 | — | — | WO | disclosed |
| EP-1370708-A1 | TOPOLOGICALLY TAILORED SPUTTERING TARGETS | Honeywell International, Inc. (US) | 2003-12-17 | — | — | EP | disclosed |
| WO-2003000950-A1 | TOPOLOGICALLY TAILORED SPUTTERING TARGETS | HONEYWELL INTERNATIONAL INC. (US) | 2003-01-03 | — | — | WO | disclosed |