⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7264238 | 0.87 | — | — | |
| SCHEMBL1650543 | 0.82 | — | — | |
| SCHEMBL5708617 | 0.82 | — | — | |
| SCHEMBL3418287 | 0.82 | — | — | |
| SCHEMBL197343 | 0.67 | — | — | |
| SCHEMBL21328561 | 0.67 | — | — | |
| SCHEMBL19181781 | 0.67 | — | — | |
| Water SCHEMBL22228572 | 0.67 | — | — | |
| Water SCHEMBL21808767 | 0.67 | — | — | |
| SCHEMBL741637 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7162791-B2 | Method of manufacturing integrated spin valve head | HEADWAY TECHNOLOGIES, INC. (US) | 2007-01-16 | — | — | US | claimed |
| US-7089650-B2 | Method of manufacturing integrated spin valve head | HEADWAY TECHNOLOGIES, INC. (US) | 2006-08-15 | — | — | US | claimed |
| US-7074456-B2 | Process for manufacturing a bottom spin valve structure | HEADWAY TECHNOLOGIES, INC. (US) | 2006-07-11 | — | — | US | claimed |
| US-7060321-B2 | Process for manufacturing a top spin valve | HEADWAY TECHNOLOGIES, INC. (US) | 2006-06-13 | — | — | US | claimed |
| US-6995959-B2 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. (US) | 2006-02-07 | — | — | US | claimed |
| US-20050094321-A1 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. | 2005-05-05 | — | — | US | claimed |
| US-20050094323-A1 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. | 2005-05-05 | — | — | US | claimed |
| US-20050094326-A1 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. | 2005-05-05 | — | — | US | claimed |
| US-20050094324-A1 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. | 2005-05-05 | — | — | US | claimed |
| US-20050094325-A1 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. | 2005-05-05 | — | — | US | claimed |
| US-6885527-B1 | Process to manufacture a top spin valve | HEADWAY TECHNOLOGIES, INC. (US) | 2005-04-26 | — | — | US | claimed |
| US-6665155-B2 | Spin valve sensor with free layer structure having a cobalt niobium (CoNb) or cobalt niobium hafnium (CoNbHf) layer | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-16 | — | — | US | claimed |
| US-20020126427-A1 | Spin valve sensor with free layer structure having a cobalt niobium (CoNb) or cobalt niobium hafnium (CoNbHf) layer | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-09-12 | — | — | US | claimed |
| US-6353518-B2 | Spin valve sensor having antiparallel (AP) pinned layer structure with low coercivity and high resistance | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-03-05 | — | — | US | claimed |
| US-6353519-B2 | Spin valve sensor having antiparallel (AP) pinned layer structure with high resistance and low coercivity | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-03-05 | — | — | US | claimed |
| US-6327122-B1 | Spin valve sensor having antiparallel (AP) pinned layer with high resistance and low coercivity | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-12-04 | — | — | US | claimed |
| US-20010040780-A1 | Spin valve sensor having antiparallel (AP) pinned layer structure with high resistance and low coercivity | PINARBASI MUSTAFA (US) | 2001-11-15 | — | — | US | claimed |
| US-20010040779-A1 | Spin valve sensor having antiparallel (AP) pinned layer structure with low coercivity and high resistance | PINARBASI MUSTAFA (US) | 2001-11-15 | — | — | US | claimed |
| US-6275362-B1 | Magnetic read head having spin valve sensor with improved seed layer for a free layer | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-08-14 | — | — | US | claimed |
| US-9659758-B2 | Coils utilized in vapor deposition applications and methods of production | HONEYWELL INTERNATIONAL INC. (US) | 2017-05-23 | — | — | US | disclosed |
| US-9279178-B2 | Manufacturing design and processing methods and apparatus for sputtering targets | HONEYWELL INTERNATIONAL INC. (US) | 2016-03-08 | — | — | US | disclosed |
| US-20160023179-A1 | MICRODEVICE ARRAYS FORMED BY MAGNETIC ASSEMBLY | ARRAYOMICS INC (US) | 2016-01-28 | — | — | US | disclosed |
| US-9152905-B2 | Microdevice arrays formed by magnetic assembly | ARRAYOMICS, INC. (US) | 2015-10-06 | — | — | US | disclosed |
| CN-101849044-B | Microdevice arrays formed by magnetic assembly | ARRAYOMICS, INC. (US) | 2014-10-22 | — | — | CN | disclosed |
| US-8702919-B2 | Target designs and related methods for coupled target assemblies, methods of production and uses thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-04-22 | — | — | US | disclosed |
| US-8398833-B2 | Use of DC magnetron sputtering systems | HONEYWELL INTERNATIONAL INC. (US) | 2013-03-19 | — | — | US | disclosed |
| US-20110031109-A1 | DESIGN AND USE OF DC MAGNETRON SPUTTERING SYSTEMS | HONEYWELL INTERNATIONAL INC. (US) | 2011-02-10 | — | — | US | disclosed |
| CN-101849044-A | Micromodule equipment array by magnetic assembling formation | ARRAYOMICS INC | 2010-09-29 | — | — | CN | disclosed |
| WO-2009151767-A2 | DESIGN AND USE OF DC MAGNETRON SPUTTERING SYSTEMS | HONEYWELL INTERNATIONAL INC. (US) | 2009-12-17 | — | — | WO | disclosed |
| CN-101589307-A | Sorting of micro devices | ARRAYOMICS INC (US) | 2009-11-25 | — | — | CN | disclosed |
| EP-2118660-A1 | SORTING OF MICRODEVICES | Arrayomics, Inc. (US) | 2009-11-18 | — | — | EP | disclosed |
| EP-2118345-A2 | MICRODEVICE ARRAYS FORMED BY MAGNETIC ASSEMBLY | Arrayomics, Inc. (US) | 2009-11-18 | — | — | EP | disclosed |
| CN-100537830-C | Apparatus and method for ionized deposition of films or layers | HONEYWELL INT INC (US) | 2009-09-09 | — | — | CN | disclosed |
| CN-100473756-C | Target design for enhanced cooling and reduced deflection and deformation and related methods | HONEYWELL INT INC (US) | 2009-04-01 | — | — | CN | disclosed |
| US-20090078570-A1 | TARGET/BACKING PLATE CONSTRUCTIONS, AND METHODS OF FORMING TARGET/BACKING PLATE CONSTRUCTIONS | HONEYWELL INTERNATIONAL INC. | 2009-03-26 | — | — | US | disclosed |
| WO-2009023529-A1 | TARGET DESIGNS AND RELATED METHODS FOR COUPLED TARGET ASSEMBLIES, METHODS OF PRODUCTION AND USES THEREOF | HONEYWELL INTERNATIONAL INC. (US) | 2009-02-19 | — | — | WO | disclosed |
| US-20090045044-A1 | Novel manufacturing design and processing methods and apparatus for sputtering targets | HONEYWELL INTERNATIONAL INC. | 2009-02-19 | — | — | US | disclosed |
| US-20090045051-A1 | TARGET DESIGNS AND RELATED METHODS FOR COUPLED TARGET ASSEMBLIES, METHODS OF PRODUCTION AND USES THEREOF | SOLSTICE ADVANCED MATERIALS US, INC. | 2009-02-19 | — | — | US | disclosed |
| WO-2008153608-A2 | MICRODEVICE ARRAYS FORMED BY MAGNETIC ASSEMBLY | ARRAYOMICS, INC. (US) | 2008-12-18 | — | — | WO | disclosed |
| US-20080289958-A1 | Novel Manufacturing Design and Processing Methods and Apparatus for Sputtering Targets | SOLSTICE ADVANCED MATERIALS US, INC. | 2008-11-27 | — | — | US | disclosed |
| WO-2008134516-A2 | NOVEL MANUFACTURING DESIGN AND PROCESSING METHODS AND APPARATUS FOR SPUTTERING TARGETS | HONEYWELL INTERNATIONAL INC. (US) | 2008-11-06 | — | — | WO | disclosed |
| WO-2008091731-A2 | TARGET DESIGNS AND RELATED METHODS FOR REDUCED EDDY CURRENTS, INCREASED RESISTANCE AND RESISTIVITY, AND ENHANCED COOLING | HONEYWELL INTERNATIONAL INC. (US) | 2008-07-31 | — | — | WO | disclosed |
| WO-2008091696-A1 | SORTING OF MICRODEVICES | ARRAYOMICS, INC. (US) | 2008-07-31 | — | — | WO | disclosed |
| WO-2008060917-A9 | METHODS FOR MAKING SPUTTERING TARGETS | HONEYWELL INT INC (US) | 2008-07-31 | — | — | WO | disclosed |
| US-20080176762-A1 | Microdevice Arrays Formed by Magnetic Assembly | ARRAYOMICS, INC. (US) | 2008-07-24 | — | — | US | disclosed |
| US-20080173541-A1 | Target designs and related methods for reduced eddy currents, increased resistance and resistivity, and enhanced cooling | HONEYWELL INTERNATIONAL INC. | 2008-07-24 | — | — | US | disclosed |
| US-20080176765-A1 | Sorting Of Microdevices | ARRAYOMICS, INC. (US) | 2008-07-24 | — | — | US | disclosed |
| WO-2008060917-A2 | METHODS FOR MAKING SPUTTERING TARGETS | HONEYWELL INTERNATIONAL INC. (US) | 2008-05-22 | — | — | WO | disclosed |
| US-20080110746-A1 | Novel manufacturing design and processing methods and apparatus for sputtering targets | HONEYWELL INTERNATIONAL INC. | 2008-05-15 | — | — | US | disclosed |
| EP-1595003-A4 | APPARATUS AND METHODS FOR IONIZED DEPOSITION OF A FILM OR THIN LAYER | HONEYWELL INT INC (US) | 2008-03-26 | — | — | EP | disclosed |
| CN-101146928-A | Coils utilized in vapor deposition applications and methods of production | HONEYWELL INT INC (US) | 2008-03-19 | — | — | CN | disclosed |
| EP-1583852-A4 | TARGET DESIGNS AND RELATED METHODS FOR ENHANCED COOLING AND REDUCED DEFLECTION AND DEFORMATION | HONEYWELL INT INC (US) | 2008-03-05 | — | — | EP | disclosed |
| WO-2008022061-A2 | PVD TARGETS AND METHODS FOR THEIR MANUFACTURE | HONEYWELL INTERNATIONAL INC. (US) | 2008-02-21 | — | — | WO | disclosed |
| US-20080041720-A1 | Novel manufacturing design and processing methods and apparatus for PVD targets | HONEYWELL INTERNATIONAL INC. | 2008-02-21 | — | — | US | disclosed |
| EP-1861518-A2 | COILS UTILIZED IN VAPOR DEPOSITION APPLICATIONS AND METHODS OF PRODUCTION | Honeywell International Inc. (US) | 2007-12-05 | — | — | EP | disclosed |
| US-20070141857-A1 | Target designs and related methods for enhanced cooling and reduced deflection and deformation | HONEYWELL INTERNATIONAL INC. | 2007-06-21 | — | — | US | disclosed |
| US-7162791-B2 | Method of manufacturing integrated spin valve head | HEADWAY TECHNOLOGIES, INC. (US) | 2007-01-16 | — | — | US | disclosed |
| US-20060278520-A1 | Use of DC magnetron sputtering systems | HONEYWELL INTERNATIONAL INC. | 2006-12-14 | — | — | US | disclosed |
| US-20060213769-A1 | Coils utilized in vapor deposition applications and methods of production | HONEYWELL INTERNATIONAL INC. | 2006-09-28 | — | — | US | disclosed |
| WO-2006101693-A2 | COILS UTILIZED IN VAPOR DEPOSITION APPLICATIONS AND METHODS OF PRODUCTION | HONEYWELL INTERNATIONAL INC. (US) | 2006-09-28 | — | — | WO | disclosed |
| US-7089650-B2 | Method of manufacturing integrated spin valve head | HEADWAY TECHNOLOGIES, INC. (US) | 2006-08-15 | — | — | US | disclosed |
| US-7074456-B2 | Process for manufacturing a bottom spin valve structure | HEADWAY TECHNOLOGIES, INC. (US) | 2006-07-11 | — | — | US | disclosed |
| US-7060321-B2 | Process for manufacturing a top spin valve | HEADWAY TECHNOLOGIES, INC. (US) | 2006-06-13 | — | — | US | disclosed |
| CN-1764736-A | Apparatus and methods for ionized deposition of a film or thin layer | HONEYWELL INT INC (US) | 2006-04-26 | — | — | CN | disclosed |
| CN-1751137-A | Target design for enhanced cooling and reduced deflection and deformation and related methods | HONEYWELL INT INC (US) | 2006-03-22 | — | — | CN | disclosed |
| US-6995959-B2 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. (US) | 2006-02-07 | — | — | US | disclosed |
| EP-1595003-A2 | APPARATUS AND METHODS FOR IONIZED DEPOSITION OF A FILM OR THIN LAYER | Honeywell International, Inc. (US) | 2005-11-16 | — | — | EP | disclosed |
| EP-1583852-A2 | TARGET DESIGNS AND RELATED METHODS FOR ENHANCED COOLING AND REDUCED DEFLECTION AND DEFORMATION | Honeywell International, Inc. (US) | 2005-10-12 | — | — | EP | disclosed |
| US-20050094323-A1 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. | 2005-05-05 | — | — | US | disclosed |
| US-20050094321-A1 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. | 2005-05-05 | — | — | US | disclosed |
| US-20050094326-A1 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. | 2005-05-05 | — | — | US | disclosed |
| US-20050094324-A1 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. | 2005-05-05 | — | — | US | disclosed |
| US-20050094325-A1 | Integrated spin valve head | HEADWAY TECHNOLOGIES, INC. | 2005-05-05 | — | — | US | disclosed |
| US-6885527-B1 | Process to manufacture a top spin valve | HEADWAY TECHNOLOGIES, INC. (US) | 2005-04-26 | — | — | US | disclosed |
| WO-2004032184-A9 | LOW TEMPERATURE SALICIDE FORMING MATERIALS AND SPUTTERING TARGETS FORMED THEREFROM | HONEYWELL INT INC (US) | 2004-10-21 | — | — | WO | disclosed |
| WO-2004066360-A2 | APPARATUS AND METHODS FOR IONIZED DEPOSITION OF A FILM OR THIN LAYER | HONEYWELL INTERNATIONAL INC (US) | 2004-08-05 | — | — | WO | disclosed |
| WO-2004024979-A9 | SENSOR SYSTEM AND METHODS USED TO DETECT MATERIAL WEAR AND SURFACE DETERIORATION | HONEYWELL INT INC (US) | 2004-07-15 | — | — | WO | disclosed |
| US-20040104110-A1 | Topologically tailored sputtering targets | LEE EAL H (US) | 2004-06-03 | — | — | US | disclosed |
| WO-2004038059-A2 | TARGET DESIGNS AND RELATED METHODS FOR ENHANCED COOLING AND REDUCED DEFLECTION AND DEFORMATION | HONEYWELL INTERNATIONAL INC (US) | 2004-05-06 | — | — | WO | disclosed |
| WO-2004032184-A2 | LOW TEMPERATURE SALICIDE FORMING MATERIALS AND SPUTTERING TARGETS FORMED THEREFROM | HONEYWELL INTERNATIONAL, INC. (US) | 2004-04-15 | — | — | WO | disclosed |
| WO-2004024979-A1 | SENSOR SYSTEM AND METHODS USED TO DETECT MATERIAL WEAR AND SURFACE DETERIORATION | HONEYWELL INTERNATIONAL INC. (US) | 2004-03-25 | — | — | WO | disclosed |
| EP-1370708-A1 | TOPOLOGICALLY TAILORED SPUTTERING TARGETS | Honeywell International, Inc. (US) | 2003-12-17 | — | — | EP | disclosed |
| US-6665155-B2 | Spin valve sensor with free layer structure having a cobalt niobium (CoNb) or cobalt niobium hafnium (CoNbHf) layer | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-16 | — | — | US | disclosed |
| US-6665155-B2 | Spin valve sensor with free layer structure having a cobalt niobium (CoNb) or cobalt niobium hafnium (CoNbHf) layer | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-16 | — | — | US | disclosed |
| US-6665155-B2 | Spin valve sensor with free layer structure having a cobalt niobium (CoNb) or cobalt niobium hafnium (CoNbHf) layer | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-16 | — | — | US | disclosed |
| WO-2003000950-A1 | TOPOLOGICALLY TAILORED SPUTTERING TARGETS | HONEYWELL INTERNATIONAL INC. (US) | 2003-01-03 | — | — | WO | disclosed |
| US-20020126427-A1 | Spin valve sensor with free layer structure having a cobalt niobium (CoNb) or cobalt niobium hafnium (CoNbHf) layer | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-09-12 | — | — | US | disclosed |
| US-20020126427-A1 | Spin valve sensor with free layer structure having a cobalt niobium (CoNb) or cobalt niobium hafnium (CoNbHf) layer | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-09-12 | — | — | US | disclosed |
| US-20020126427-A1 | Spin valve sensor with free layer structure having a cobalt niobium (CoNb) or cobalt niobium hafnium (CoNbHf) layer | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-09-12 | — | — | US | disclosed |
| US-6449131-B2 | Canted longitudinal patterned exchange biased dual-stripe magnetoresistive (DSMR) sensor element and method for fabrication thereof | HEADWAY TECHNOLOGIES, INC. | 2002-09-10 | — | — | US | disclosed |
| US-6353519-B2 | Spin valve sensor having antiparallel (AP) pinned layer structure with high resistance and low coercivity | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-03-05 | — | — | US | disclosed |
| US-6353518-B2 | Spin valve sensor having antiparallel (AP) pinned layer structure with low coercivity and high resistance | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-03-05 | — | — | US | disclosed |
| US-6327122-B1 | Spin valve sensor having antiparallel (AP) pinned layer with high resistance and low coercivity | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-12-04 | — | — | US | disclosed |
| US-20010040779-A1 | Spin valve sensor having antiparallel (AP) pinned layer structure with low coercivity and high resistance | PINARBASI MUSTAFA (US) | 2001-11-15 | — | — | US | disclosed |
| US-20010040780-A1 | Spin valve sensor having antiparallel (AP) pinned layer structure with high resistance and low coercivity | PINARBASI MUSTAFA (US) | 2001-11-15 | — | — | US | disclosed |
| US-20010021087-A1 | Canted longitudinal patterned exchange biased dual-stripe magnetoresistive (DSMR) sensor element and method for fabrication thereof | HEADWAY TECHNOLOGIES, INC. | 2001-09-13 | — | — | US | disclosed |
| US-6275362-B1 | Magnetic read head having spin valve sensor with improved seed layer for a free layer | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-08-14 | — | — | US | disclosed |
| US-6230390-B1 | Canted longitudinal patterned exchange biased dual-stripe magnetoresistive (DSMR) sensor element and method for fabrication thereof | HEADWAY TECHNOLOGIES, INC. | 2001-05-15 | — | — | US | disclosed |
| US-6169646-B1 | Magnetoresistive shield incorporating seedlayer for anisotropy enhancement | SEAGATE TECHNOLOGY, INC. | 2001-01-02 | — | — | US | disclosed |
| US-5909344-A | Magnetoresistive sensor with high resistivity flux guide | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-06-01 | — | — | US | disclosed |
| US-5719730-A | Low fringe-field and narrow write-track magneto-resistive (MR) magnetic read-write head | HEADWAY TECHNOLOGIES, INC. (US) | 1998-02-17 | — | — | US | disclosed |
| EP-0373793-A2 | Lift-off process for patterning shields in thin magnetic recording heads | Hewlett-Packard Company (US) | 1990-06-20 | — | — | EP | disclosed |
| US-4933209-A | Method of making a thin film recording head apparatus utilizing polyimide films | HEWLETT-PACKARD COMPANY (US) | 1990-06-12 | — | — | US | disclosed |
| US-4853080-A | Lift-off process for patterning shields in thin magnetic recording heads | HEWLETT-PACKARD (US) | 1989-08-01 | — | — | US | disclosed |
| US-4853080-A | Lift-off process for patterning shields in thin magnetic recording heads | HEWLETT-PACKARD (US) | 1989-08-01 | — | — | US | disclosed |