SCHEMBL11907686

SCHEMBL11907686

CCC(OC(=O)C1CC2C=CC1C2)OC1CCCC1

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.42
LMNA P02545 2/20 0.37
KDM4E B2RXH2 1/20 0.37
HPGD P15428 1/20 0.35
POLB P06746 3/20 0.35
KMT2A Q03164 2/20 0.35
RAB9A P51151 1/20 0.34
APEX1 P27695 1/20 0.33
RECQL P46063 1/20 0.33
BLM P54132 1/20 0.33
ESR2 Q92731 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
MAPK1 P28482 2/20 0.33
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11909953 0.83 ALDH1A1 (0.47) ALDH1A1LMNAKDM4EHPGDPOLB
SCHEMBL22264001 0.82 ALDH1A1 (0.46) ALDH1A1LMNAKDM4EHPGDPOLB
SCHEMBL3363921 0.82 ALDH1A1 (0.46) ALDH1A1LMNAKDM4EHPGDPOLB
SCHEMBL11909238 0.80 ALDH1A1 (0.41) ALDH1A1LMNAKDM4EHPGDPOLB
SCHEMBL951662 0.76 ALDH1A1 (0.51) ALDH1A1LMNAKDM4EHPGDPOLB
SCHEMBL5186051 0.76 ALDH1A1 (0.48) ALDH1A1LMNAKDM4EHPGDPOLB
SCHEMBL11907848 0.75 ALDH1A1 (0.51) ALDH1A1LMNAKDM4EHPGDPOLB
SCHEMBL11909352 0.75
SCHEMBL20579895 0.75 ALDH1A1 (0.44) ALDH1A1LMNAKDM4EHPGDPOLB
SCHEMBL32688533 0.74 ALDH1A1 (0.50) ALDH1A1LMNAKDM4EHPGDPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
US-8450440-B2 Method for purifying polymer and polymer MITSUI CHEMICALS, INC. (JP) 2013-05-28 US disclosed
US-20120208976-A1 METHOD FOR PURIFYING POLYMER AND POLYMER MITSUI CHEMICALS, INC (JP) 2012-08-16 US disclosed