SCHEMBL11908076

SCHEMBL11908076

CCOC(=O)COC(=O)C1CC2C=CC1C2

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 11/20 0.52
RAB9A P51151 1/20 0.52
HPGD P15428 1/20 0.50
POLB P06746 3/20 0.49
KMT2A Q03164 3/20 0.49
HSD17B10 Q99714 2/20 0.47
APEX1 P27695 1/20 0.47
RECQL P46063 1/20 0.47
BLM P54132 1/20 0.47
ESR2 Q92731 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
MAPK1 P28482 2/20 0.45
LMNA P02545 2/20 0.42
KDM4E B2RXH2 2/20 0.42
MAPT P10636 1/20 0.40
HTT P42858 2/20 0.39
MEN1 O00255 1/20 0.39
ALOX15 P16050 1/20 0.39
TSHR P16473 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2754655 0.89 ALDH1A1 (0.49) ALDH1A1RAB9AHPGDPOLBKMT2A
SCHEMBL200507 0.89 ALDH1A1 (0.49) ALDH1A1RAB9AHPGDPOLBKMT2A
SCHEMBL11702317 0.89 ALDH1A1 (0.49) ALDH1A1RAB9AHPGDPOLBKMT2A
SCHEMBL2754654 0.89 ALDH1A1 (0.49) ALDH1A1RAB9AHPGDPOLBKMT2A
SCHEMBL29452889 0.89 ALDH1A1 (0.49) ALDH1A1RAB9AHPGDPOLBKMT2A
SCHEMBL31178091 0.89 ALDH1A1 (0.49) ALDH1A1RAB9AHPGDPOLBKMT2A
SCHEMBL11908859 0.88 ALDH1A1 (0.53) ALDH1A1RAB9AHPGDPOLBKMT2A
SCHEMBL11908866 0.86 ALDH1A1 (0.57) ALDH1A1RAB9AHPGDPOLBKMT2A
SCHEMBL11908328 0.86 ALDH1A1 (0.49) ALDH1A1RAB9AHPGDPOLBKMT2A
SCHEMBL11908618 0.84 ALDH1A1 (0.49) ALDH1A1RAB9AHPGDPOLBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 CN disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
CN-111183395-A Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2020-05-19 CN disclosed
CN-110709774-A Material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2020-01-17 CN disclosed
US-8450440-B2 Method for purifying polymer and polymer MITSUI CHEMICALS, INC. (JP) 2013-05-28 US disclosed
US-20120208976-A1 METHOD FOR PURIFYING POLYMER AND POLYMER MITSUI CHEMICALS, INC (JP) 2012-08-16 US disclosed