Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MDM4 | O15151 | 3/20 | 0.66 |
| ▸ | TP53 | P04637 | 3/20 | 0.66 |
| ▸ | MDM2 | Q00987 | 7/20 | 0.57 |
| ▸ | CASP3 | P42574 | 2/20 | 0.46 |
| ▸ | SLC17A5 | Q9NRA2 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1829788 | 1.00 | MDM4 (0.66) | MDM4TP53MDM2CASP3SLC17A5 | |
| SCHEMBL30353583 | 1.00 | MDM4 (0.66) | MDM4TP53MDM2CASP3SLC17A5 | |
| SCHEMBL120638 | 0.84 | MDM4 (0.67) | MDM4TP53MDM2CASP3SLC17A5 | |
| SCHEMBL119548 | 0.84 | MDM4 (0.67) | MDM4TP53MDM2CASP3SLC17A5 | |
| SCHEMBL19815024 | 0.82 | MDM4 (0.67) | MDM4TP53MDM2CASP3 | |
| SCHEMBL19815022 | 0.82 | MDM4 (0.67) | MDM4TP53MDM2CASP3 | |
| SCHEMBL8895610 | 0.79 | MDM4 (0.62) | MDM4TP53MDM2CASP3SLC17A5 | |
| SCHEMBL14432835 | 0.79 | MDM4 (0.59) | MDM4TP53MDM2CASP3SLC17A5 | |
| SCHEMBL14788958 | 0.79 | MDM4 (0.59) | MDM4TP53MDM2CASP3SLC17A5 | |
| SCHEMBL1486216 | 0.78 | MDM4 (0.61) | MDM4TP53MDM2CASP3SLC17A5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |