Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | FABP5 | Q01469 | 3/20 | 0.40 |
| ▸ | FABP7 | O15540 | 2/20 | 0.40 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.37 |
| ▸ | CASP3 | P42574 | 3/20 | 0.36 |
| ▸ | EGFR | P00533 | 1/20 | 0.34 |
| ▸ | MDM4 | O15151 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.34 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL119872 | 0.88 | KMT2A (0.42) | KMT2AFABP5FABP7EPHX2CASP3 | |
| SCHEMBL119409 | 0.81 | FABP5 (0.46) | KMT2AFABP5FABP7EPHX2CASP3 | |
| SCHEMBL30422869 | 0.81 | KMT2A (0.46) | KMT2AFABP5FABP7 | |
| SCHEMBL30861798 | 0.79 | KMT2A (0.45) | KMT2AFABP5FABP7EPHX2CASP3 | |
| SCHEMBL21838104 | 0.79 | KMT2A (0.45) | KMT2AFABP5FABP7EPHX2CASP3 | |
| SCHEMBL119880 | 0.79 | KMT2A (0.45) | KMT2AFABP5FABP7EPHX2CASP3 | |
| SCHEMBL30819584 | 0.75 | KMT2A (0.48) | KMT2AFABP5FABP7EPHX2CASP3 | |
| SCHEMBL16568495 | 0.74 | KMT2A (0.40) | KMT2AFABP5FABP7EPHX2CA1 | |
| SCHEMBL8606944 | 0.73 | KMT2A (0.48) | KMT2AFABP5FABP7 | |
| SCHEMBL30812377 | 0.73 | FABP5 (0.43) | KMT2AFABP5FABP7EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |