SCHEMBL119409

SCHEMBL119409

O=C(O)[C@H]1COCN1C(=O)OCC1c2ccccc2-c2ccccc21

nearest known ligand 0.46

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
FABP5 Q01469 3/20 0.46
FABP7 O15540 2/20 0.46
KMT2A Q03164 2/20 0.41
EPHX2 P34913 1/20 0.39
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
OPRD1 P41143 1/20 0.37
MDM4 O15151 1/20 0.36
TP53 P04637 1/20 0.36
CASP3 P42574 1/20 0.36
DPP8 Q6V1X1 1/20 0.36
DPP9 Q86TI2 1/20 0.36
OPRL1 P41146 1/20 0.35
FKBP1A P62942 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30510409 0.88 FABP5 (0.44) FABP5FABP7KMT2AEPHX2OPRD1
SCHEMBL15285020 0.88 FABP5 (0.44) FABP5FABP7KMT2AEPHX2OPRD1
SCHEMBL17596685 0.88 FABP5 (0.44) FABP5FABP7KMT2AEPHX2OPRD1
SCHEMBL15285015 0.88 FABP5 (0.44) FABP5FABP7KMT2AEPHX2OPRD1
SCHEMBL30510389 0.88 FABP5 (0.44) FABP5FABP7KMT2AEPHX2OPRD1
SCHEMBL30510381 0.88 FABP5 (0.44) FABP5FABP7KMT2AEPHX2OPRD1
SCHEMBL30812377 0.86 FABP5 (0.43) FABP5FABP7KMT2AEPHX2OPRD1
SCHEMBL119872 0.83 KMT2A (0.42) FABP5FABP7KMT2AEPHX2CA1
SCHEMBL119407 0.81 KMT2A (0.46) FABP5FABP7KMT2AEPHX2CA1
SCHEMBL29540385 0.81 FABP5 (0.49) FABP5FABP7KMT2AEPHX2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8895231-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-25 US disclosed
US-8895231-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-25 US disclosed
US-20120058428-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 US disclosed
US-20120058428-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 US disclosed