SCHEMBL11948971

SCHEMBL11948971

CCC(C)(C)C(=O)OCCCC(=O)OC1C2CC3CC1CC(C)(C3)C2

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 15/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11948967 0.93 EPHX2 (0.32) EPHX2
SCHEMBL11948911 0.86 HSD11B1 (0.30)
SCHEMBL11948965 0.86 HSD11B1 (0.34) EPHX2
SCHEMBL12240741 0.83 HSD11B1 (0.33)
SCHEMBL11948962 0.82 EPHX2 (0.38) EPHX2
SCHEMBL11948970 0.81 EPHX2 (0.36) EPHX2
SCHEMBL11948956 0.78 HSD11B1 (0.36) EPHX2
SCHEMBL13231696 0.76 EPHX2 (0.33) EPHX2
SCHEMBL12555072 0.75 EPHX2 (0.37) EPHX2
SCHEMBL2734983 0.74 EPHX2 (0.43) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8232039-B2 Polymer and resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-07-31 US disclosed
US-20100124719-A1 Polymer and Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-05-20 US disclosed