Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.45 |
| ▸ | FABP5 | Q01469 | 3/20 | 0.44 |
| ▸ | FABP7 | O15540 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2039581 | 0.85 | KMT2A (0.42) | KMT2AEPHX2FABP5FABP7CA1 | |
| SCHEMBL26632669 | 0.85 | KMT2A (0.44) | KMT2AEPHX2FABP5FABP7CA1 | |
| SCHEMBL15181329 | 0.84 | KMT2A (0.51) | KMT2AEPHX2FABP5FABP7MEN1 | |
| SCHEMBL341372 | 0.83 | KMT2A (0.43) | KMT2AEPHX2FABP5FABP7OPRD1 | |
| SCHEMBL3173765 | 0.82 | KMT2A (0.44) | KMT2AEPHX2FABP5FABP7OPRD1 | |
| SCHEMBL6013918 | 0.81 | FABP5 (0.44) | KMT2AEPHX2FABP5FABP7 | |
| SCHEMBL524832 | 0.81 | FABP5 (0.44) | KMT2AEPHX2FABP5FABP7 | |
| SCHEMBL25797253 | 0.79 | KMT2A (0.41) | KMT2AEPHX2FABP5FABP7CA1 | |
| SCHEMBL30062804 | 0.78 | FABP5 (0.57) | KMT2AEPHX2FABP5FABP7CA1 | |
| SCHEMBL28659758 | 0.78 | FABP5 (0.45) | KMT2AEPHX2FABP5FABP7OPRD1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8507175-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8426115-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-8426115-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20120202158-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120202158-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20110091812-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20110091812-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20110033803-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20110033803-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-10 | — | — | US | disclosed |
| US-7718343-B2 | Decomposable resin composition and pattern-forming material including the same | FUJIFILM CORPORATION (JP) | 2010-05-18 | — | — | US | disclosed |
| US-7718343-B2 | Decomposable resin composition and pattern-forming material including the same | FUJIFILM CORPORATION (JP) | 2010-05-18 | — | — | US | disclosed |
| US-7402374-B2 | Method for colored image formation | FUJIFILM CORPORATION (JP) | 2008-07-22 | — | — | US | disclosed |
| US-7402374-B2 | Method for colored image formation | FUJIFILM CORPORATION (JP) | 2008-07-22 | — | — | US | disclosed |
| US-20080070154-A1 | DECOMPOSABLE RESIN COMPOSITION AND PATTERN-FORMING MATERIAL INCLUDING THE SAME | FUJIFILM CORPORATION (JP) | 2008-03-20 | — | — | US | disclosed |
| US-20080070154-A1 | DECOMPOSABLE RESIN COMPOSITION AND PATTERN-FORMING MATERIAL INCLUDING THE SAME | FUJIFILM CORPORATION (JP) | 2008-03-20 | — | — | US | disclosed |